Abstract
The new laser micromachining projection microscope enables a surface to be viewed at high magnification with a built-in facility for micromachining of the same surface according to a predetermined pattern. A XeCl-excimer laser forms part of the device and provides bright viewing illumination in amplified spontaneous emission as well as a small laser spot of sufficient fluence to mark the sample surface. The basic characteristics of image enhancement in the excimer amplifier are presented. The advantage of such a technique for both pattern generation, surface cleaning and mask correction is demonstrated on Al, Cu and W specimens with a spatial resolution better than 3 μm.
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D. Bäuerle: Chemical Processing with Lasers, Springer Ser. Mater. Sci., Vol. 1 (Springer, Berlin, Heidelberg 1986)
I.W. Boyd: Laser Processing of Thin Films and Microstructures, Springer Ser. Mater. Sci., Vol. 3 (Springer, Berlin, Heidelberg 1987)
O. Gottsleben, M. Stuke: Appl. Phys. Lett. 52, 2230–2232 (1988)
D.J. Ehrlich, J.Y. Tsao, C.O. Bozler: J. Vac. Sci. Technol. B3, 1–8 (1985)
F. Foulon, M. Green, F.N. Goodall, S. De Unamuno: J. Appl. Phys. 71, 2898–2907 (1992)
U. Sarbach, H.-J. Kahlert: Lambda Highlights 40, 2–4 (1993)
O. Lehmann, M. Stuke: Appl. Phys. A53, 343–345 (1991)
T.W. Hänsch, F. Varsanyi, A.L. Schawlow: Appl. Phys. Lett. 18, 108–110 (1971)
K. Zemskov, M. Kazaryan, G.G. Petrash: Proc. SPIE 1041, 77–84 (1989)
A.M. Bakiev, S.Kh. Valie, N.V. Kryazhev: Sov. J. Quantum Electron. 20, 871–872 (1990)
D.T. Alimov, A.M. Bakiev, V.A. Boyrev, M.R. Bruk, V.A. Zimin, L.A. Zimina, B.S. Luk'yanchuk, G.A. Shafeev: Sov. Phys.-Tech. Phys. 34, 808–809 (1989)
M.R. Brook, K.I. Grandberg, G.A. Shafeev: Appl. Phys. A 52, 78–81 (1991)
P. Heszler, Z. Bor, G. Kovács, B. Rácz: Opt. Quantum Electron. 20, 377–381 (1988)
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Osvay, K., Bor, Z., Rácz, B. et al. Direct writing and in-situ material processing by a laser-micromachining projection microscope. Appl. Phys. A 58, 211–214 (1994). https://doi.org/10.1007/BF00324377
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DOI: https://doi.org/10.1007/BF00324377