Abstract
Ohmic contacts were formed on n-GaAs using thin evaporated layers of Te followed by bombardment of 100 keV Ar+ ions. The specific contact resistance σc showed a strong dependence on the ion dose in the range 1014 to 1016 ions cm−2, with higher doses leading to progressively lower specific contact resistance. The substrate temperature during ion bombardment was varied in the range from 25 to 200° C and was found to have only a minor effect on the resultant values of σc. Elevated temperature aging of the Ohmic contacts at 200° C resulted in a progressive increase in the specific contact resistance, independent of either the ion dose or the substrate temperature used for ion beam mixing. Rutherford backscattering studies (RBS) indicate that the Ohmic contact behaviour was due to the in-diffusion of Te and subsequent formation of a heavily doped n + layer at the Te-GaAs interface.
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A. Piotrowska, A. Guivarch, G. Pelous: Solid State Electron. 26, 179 (1983)
S.S. Gill, J.R. Dawsey: Thin Solid Films 167, 161 (1988)
K. Prasad, L. Faraone, A.G. Nassibian: Semicond. Sci. Technol. 4, 458 (1989)
G. Eckhardt: In Laser and Electron Beam Processing of Materials, ed. by C.W. White, P.S. Peercy (Academic, New York 1980) p. 467
K. Prasad, L. Faraone, A.G. Nassibian: Semicond. Sci. Technol. 4, 657 (1989)
J. Wurfl, A.G. Nassibian, H.L. Hartnagel, R. Langfeld, C. Maurer: Int. J. Electron. 66, 213 (1989)
M. Kolawa, W. Flick, C.W. Nieh, J.M. Molarius, M.A. Nicolet, J.L. Tandon, J.H. Madok, F.C.T. So: IEEE Trans. ED-36, 1223 (1989)
E.D. Marshall, W.X. Chen, C.S. Wu, S.S. Lau: Appl. Phys. Lett. 47, 298 (1985)
J. Zhao, D.A. Thomson: J. Electron. Materials 17, 249 (1988)
C. Cozzolino, S.T. Johnson, J.S. Williams: Proc. 5th Australian Conference on Nuclear Techniques of Analysis (Lucas Heights, Sydney, Australia 1987) p. 89
G.K. Reeves: Solid State Electron. 23, 487 (1980)
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Prasad, K. Formation of Ohmic contacts to n-GaAs using ion beam mixing of Tellurium. Appl. Phys. A 54, 523–526 (1992). https://doi.org/10.1007/BF00324333
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DOI: https://doi.org/10.1007/BF00324333