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Magnetoresistivity of bismuth films in magnetic fields to 19 Tesla

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Abstract

The longitudinal and transverse magnetoresistance to fields of 19 Tesla and 4.2 K has been measured for bismuth films ranging in thickness from 0.01 to 2 μm. We have observed a pronounced maximum in the longitudinal magnetoresistance which is thickness dependent. We compare these results with classical size effect theories for the longitudinal magnetoresistance in terms of magnetic-field-dependent electron scattering at grain and film boundaries. Measurements of the longitudinal magnetoresistance to 38 Tesla show a quenching of the classical size effect in the high field limit. This result strongly supports our analysis.

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Authors and Affiliations

  1. Boston University, 02215, Boston, MA, USA

    C. M. Lerner, Y. P. Ma & J. S. Brooks

  2. Francis Bitter National Magnet Laboratory, MIT, Cambridge, MA, USA

    R. Messervey & P. Tedrow

Authors
  1. C. M. Lerner
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  2. Y. P. Ma
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  3. J. S. Brooks
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  4. R. Messervey
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  5. P. Tedrow
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Work supported by NSF grant #DMR 8113456

Supported by the National Science Foundation

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Lerner, C.M., Ma, Y.P., Brooks, J.S. et al. Magnetoresistivity of bismuth films in magnetic fields to 19 Tesla. Appl. Phys. A 52, 433–437 (1991). https://doi.org/10.1007/BF00323655

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  • DOI: https://doi.org/10.1007/BF00323655

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