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Quantification of SIMS depth profiles of ODS-superalloys by using cluster ion formation from reactive primary ions

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Abstract

Cluster ion formation, with both oxygen and caesium as reactive elements, (MO− and MCs+ ions) has been studied using secondary ion mass spectrometry. A comparison of various primary ion beam conditions is given. The investigations were carried out on aluminium oxide films and required a special charge compensation method. An improvement in the quantification concentration by use of cluster ions can only be expected from MCs+ measurements; however the total ionization probabilities still depend on matrix composition.

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Authors and Affiliations

  1. Institut für Festkörper- und Werkstofforschung e. V., Postfach, D-01171, Dresden, Germany

    S. Oswald

  2. Institut für Werkstoffe der Energietechnik, KFA Jülich GmbH, Postfach 1913, D-52425, Jülich, Germany

    W. J. Quadakkers

Authors
  1. S. Oswald
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  2. W. J. Quadakkers
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Oswald, S., Quadakkers, W.J. Quantification of SIMS depth profiles of ODS-superalloys by using cluster ion formation from reactive primary ions. Fresenius J Anal Chem 349, 140–141 (1994). https://doi.org/10.1007/BF00323238

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  • DOI: https://doi.org/10.1007/BF00323238

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