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Effect of temperature on the formation of surface layers in plasma-assisted chemical vapour deposition processes carried out in an atmosphere containing Ti(OiC3H7)4 vapours

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Journal of Materials Science Letters

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References

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Authors and Affiliations

  1. Faculty of Materials Science and Engineering, Warsaw University of Technology, 02-524, Warszawa, Narbutta 85, Poland

    J. R. Sobiecki & T. Wierzchon

  2. Institute of Inorganic Chemistry and Metallurgy of Rare Elements, Wrocław Technical University, 50-370, Wrocław, Poland

    B. Kułakowska-Pawlak & W. Żyrnicki

Authors
  1. J. R. Sobiecki
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  2. T. Wierzchon
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  3. B. Kułakowska-Pawlak
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  4. W. Żyrnicki
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Sobiecki, J.R., Wierzchon, T., Kułakowska-Pawlak, B. et al. Effect of temperature on the formation of surface layers in plasma-assisted chemical vapour deposition processes carried out in an atmosphere containing Ti(OiC3H7)4 vapours. J Mater Sci Lett 15, 159–161 (1996). https://doi.org/10.1007/BF00291455

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  • DOI: https://doi.org/10.1007/BF00291455

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