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Justification of the assumption of transport. by diffusion in the interwafer region of a multiwafer CVD reactor

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Journal of Materials Science Letters

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  1. Department of Chemical Engineering, Chemistry & Environmental Science, New Jersey Institute of Technology, 07102, Newark, N.J., USA

    N. W. Loney

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  1. N. W. Loney
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Loney, N.W. Justification of the assumption of transport. by diffusion in the interwafer region of a multiwafer CVD reactor. J Mater Sci Lett 15, 1219–1220 (1996). https://doi.org/10.1007/BF00274380

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  • DOI: https://doi.org/10.1007/BF00274380

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