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High-rate deposition of titanium silicides under high gas flow rate by chemical vapour deposition

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Itami Research Laboratories, Sumitomo Electric Industries, Ltd, 1-1-1 Koya-Kita, 664, Itami, Hyogo, Japan

    C. Kawai

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  1. C. Kawai
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Kawai, C. High-rate deposition of titanium silicides under high gas flow rate by chemical vapour deposition. J Mater Sci Lett 13, 860–862 (1994). https://doi.org/10.1007/BF00273230

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  • DOI: https://doi.org/10.1007/BF00273230

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