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The role of misrepair processes in the isolation of new types of streptomycin-resistant mutants in Escherichia coli

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Summary

Treatment of Escherichia coli cells with ethylmethanesulfonate followed by a prolonged delay for phenotypic expression allows to select new types of streptomycin-resistant mutants, which are double mutants with one change resulting from base mispairing and the second one from misrepair. The errorprone recA-dependent pathway is involved in this misrepair, as evidenced by the fact that recA strains do not provide double mutants.

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Communicated by H.G. Wittmann

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Lacoste, L., Lacaille, M. & Brakier-Gingras, L. The role of misrepair processes in the isolation of new types of streptomycin-resistant mutants in Escherichia coli . Molec. Gen. Genet. 157, 313–318 (1977). https://doi.org/10.1007/BF00268668

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