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Mating due to loss of surface exclusion as a cause for thermosensitive growth of bacteria containing the Rtsl plasmid

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Summary

At 25° C, Rtsl+ bacteria grow to about 5x109 bacterial/ml before leveling off, whereas at 42° C they grow from 2.6x108 bacteria/ml for only 2.3 generations after temperature shift before the growth is inhibited with a zig-zag pattern at the plateau. When diluted, Rtsl+ bacteria grow rapidly at 42° C, until the concentration reaches as high as the undiluted 42° C culture when growth measured by colony counts stops and the zig-zag pattern again appears. This density-dependent growth inhibition is not due to the presence of stable growth inhibitor(s). Mating experiments show that at 42° C, Rtsl+ bacteria retain good donor ability; at the same time, they become good recipients in mating with Hfr (Rtsl) bacteria. SDS-PAGE reveals that membranes are altered at 42° C. Examination of DNA synthesis indicates that chromosomal DNA is synthesized at both 25° C and 42° C at high bacterial concentration, but that of the Rtsl plasmid is slowed down at 42° C. The labeling experiments suggest that in 2 h there are 2 rounds of plasmid replication at 25° C, 3.5 rounds at 42° C when bacteria are diluted, and 0.6 rounds at 42° C when bacteria are not diluted. These results suggest that the growth inhibition of Rtsl+ bacteria at 42° C is probably the consequence of mating initiated due to loss of surface exclusion.

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Communicated by T. Yura

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Ou, J.T. Mating due to loss of surface exclusion as a cause for thermosensitive growth of bacteria containing the Rtsl plasmid. Molec. Gen. Genet. 180, 501–510 (1980). https://doi.org/10.1007/BF00268053

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  • DOI: https://doi.org/10.1007/BF00268053

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