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Effects of Ne+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Centre for High Tc Superconductivity, SW7 2BP, Imperial College, London, UK

    Y. H. Li, A. E. Staton-Bevan, T. J. Tate, M. J. Lee, Yupu Li & J. A. Kilner

  2. IRC in Superconductivity, University of Cambridge, Cambridge, CB2 3QZ, UK

    R. E. Somekh

Authors
  1. Y. H. Li
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  2. A. E. Staton-Bevan
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  3. T. J. Tate
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  4. M. J. Lee
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  5. Yupu Li
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  6. J. A. Kilner
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  7. R. E. Somekh
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Li, Y.H., Staton-Bevan, A.E., Tate, T.J. et al. Effects of Ne+ implantation and rapid thermal annealing on the microstructure and electrical properties of YBCO thin films. J Mater Sci Lett 15, 1836–1838 (1996). https://doi.org/10.1007/BF00264070

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  • DOI: https://doi.org/10.1007/BF00264070

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