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Polymers of α-substituted benzyl methacrylates as a new type of electron-beam resist

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Summary

Polymer of α-substituted benzyl methacrylate was found to be used as a new type of positive electron-beam resist, which forms methacrylic acid units in the polymer chain on the exposure to electron-beam and can be developed using alkaline solution as a developer. The sensitivity was dependent on the bulkiness of the ester group and the number of ß-hydrogen atoms in the ester group. The sensitivity and γ-value of atactic poly(α, α-dimethylbenzyl methacrylate) were improved by a factor of more than three over poly (methyl methacrylate).

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Authors and Affiliations

  1. Department of Chemistry, Faculty of Engineering Science, Osaka University, Toyonaka, 560, Osaka, Japan

    Koichi Hatada, Tatsuki Kitayama, Shigeru Danjo, Yutaka Tsubokura & Heimei Yuki

  2. Department of Electrical Engineering, Faculty of Engineering Science, Osaka University, Toyonaka, 560, Osaka, Japan

    Kazuyuki Moriwaki, Hiroaki Aritome & Susumu Namba

Authors
  1. Koichi Hatada
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  2. Tatsuki Kitayama
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  3. Shigeru Danjo
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  4. Yutaka Tsubokura
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  5. Heimei Yuki
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  6. Kazuyuki Moriwaki
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  7. Hiroaki Aritome
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  8. Susumu Namba
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Hatada, K., Kitayama, T., Danjo, S. et al. Polymers of α-substituted benzyl methacrylates as a new type of electron-beam resist. Polymer Bulletin 10, 45–50 (1983). https://doi.org/10.1007/BF00263237

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  • DOI: https://doi.org/10.1007/BF00263237

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