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Experimental investigation of the terminal effect in lead electrodeposition onto resistive substrates

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Abstract

The nonuniformity of the current distribution during electroplating onto resistive electrodes is investigated experimentally for the deposition of lead onto thin nickel-phosphorous substrates. Profiles of deposit thickness along the substrate surface are obtained and the kinetic parameters needed for modeling are evaluated. The experimental data are compared to numerical simulations, and limitations of the theoretical treatment are discussed.

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Abbreviations

a :

substrate thickness (cm)

b :

electrodeposit thickness (cm)

b avg :

average electrodeposit thickness (cm)

B :

dimensionless electrodeposit thickness

c b :

bulk concentration (mol cm-3)

c n :

Fourier series coefficient

d :

distance between counterelectrode and cathode (cm)

D :

dimensionless counterelectrode distance

D :

diffusion coefficient (cm2s-1)

E :

dimensionless overpotential

E rev :

reversible electrode potential (V)

F :

Faraday constant (96 487 C mol-1)

i :

current density (A cm-2)

i avg :

average current density (A cm-2)

i c :

local current density along the cathode (A cm-2)

i 0 :

exchange current density (A cm-2)

I :

dimensionless current density

K :

dimensionless average cathode resistance

K 0 :

dimensionless initial cathode resistance

L :

cathode length (cm)

n :

Fourier series index

R :

ideal gas constant (8.314 J mol-1 K-1)

R Ω :

ohmic resistance (Ω cm2)

s :

cathode conductance (Ω-1)

t :

time (s)

T :

absolute temperature (K)

V :

potential (V)

Wa L :

Wagner number for linear kinetics

Wa T :

Wagner number for Tafel kinetics

x :

distance along the cathode from current collector corner (cm)

X :

dimensionless distance

z :

valence

α:

symmetry coefficient

βa :

anodic Tafel constant (V)

βc :

cathodic Tafel constant (V)

η:

overpotential (V)

κ:

electrolyte conductivity (Ω-1 cm-1)

ϱ:

molar density of the electrodeposit (mol cm-3)

σa :

substrate conductivity (Ω-1 cm-1)

σb :

deposit conductivity (Ω-1 cm-1)

τ:

dimensionless deposition time( = dimensionless average deposit thickness)

ω:

angular disk rotation speed (rad s-1)

ν:

kinematic viscosity (cm2 s-1)

References

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Author information

Authors and Affiliations

  1. Laboratoire de Métallurgie Chimique, Département des Matériaux, Ecole Polytechnique Fédérale de Lausanne, MX-C Ecublens, CH-1015, Lausanne, Switzerland

    P. -H. Vallotton, M. Matlosz & D. Landolt

Authors
  1. P. -H. Vallotton
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  2. M. Matlosz
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  3. D. Landolt
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Vallotton, P.H., Matlosz, M. & Landolt, D. Experimental investigation of the terminal effect in lead electrodeposition onto resistive substrates. J Appl Electrochem 23, 927–932 (1993). https://doi.org/10.1007/BF00251029

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  • DOI: https://doi.org/10.1007/BF00251029

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