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Physisorption of krypton on thermally oxidized silicon wafers

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Journal of Materials Science Letters

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Author notes

  1. P. T. John

    Present address: , C-1/1027 Vasant Kunj, 110030, New Delhi, India

Authors and Affiliations

  1. Surface Area and Porosity Group, National Physical Laboratory, Dr K. S. Krishnan Road, 110 012, New Delhi, India

    J. N. Bohra, P. T. John & R. K. Saxena

Authors
  1. J. N. Bohra
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  2. P. T. John
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  3. R. K. Saxena
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Bohra, J.N., John, P.T. & Saxena, R.K. Physisorption of krypton on thermally oxidized silicon wafers. J Mater Sci Lett 12, 1362–1364 (1993). https://doi.org/10.1007/BF00241709

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  • DOI: https://doi.org/10.1007/BF00241709

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