An experimental approach for growth rate determination of LCVD-written aluminium stripes

Abstract

A new experimental approach for growth rate determination of microdimensional aluminium stripes written by laser-induced chemical vapour deposition (LCVD) was developed. The aluminium lines were obtained by pyrolysis of trimethylaluminium (TMA) on (100) silicon monocrystalline wafer using the focused beam of a copper bromide vapour laser. Quantitative determination of the deposit was performed by its chemical removal from the substrate into a solution and further analysis performed using inductively coupled plasma atomic emission spectroscopy. Using this analytical method, dependences of the aluminium quantity on the partial pressure of TMA and the laser power were obtained. The growth rate at direct writing with a pulsed visible laser was calculated on the basis of aluminium quantity determinations. It is demonstrated that the proposed experimental approach could be successfully used for kinetic studies of LCVD processes.