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Agglomeration problems in the formation of FeSi2 from Fe-Si thin-film couples

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Abstract

The agglomeration process that occurs during annealing of thin Fe films (<200 nm) on Si substrates has been studied. Agglomeration occurred on uncapped films prior to silicide formation. Capping layers of SiO2, or more appropriately Si-SiO2, have been used to minimize agglomeration effects. Continuous thin films of β-FeSi2 have been grown on 〈11 1〉 and 〈 100 〉 oriented substrates. Preferred growth of (202) and (220) suicide planes on 〈111〉 Si has been obtained, while preferential growth was not observed on 〈100〉 Si.

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References

  1. S. PETERSSON, J. A. REIMER, M. H. BRODSKY, D. R. CAMPBELL, F. D'HEURLE, B. Karlsson, and P. A. TOVE, J. Appl. Phys. 53 (1982) 3342.

    Google Scholar 

  2. I. NISHIDA, J. Mater. Sci. 7 (1972) 435.

    Google Scholar 

  3. I. KAWASUMI, M. SAKATA, I. NISHIDA and N. MASUMOTO, ibid. J. Mater. Sci. 16 (1981) 355.

    Google Scholar 

  4. M. C. BOST, and J. E. MAHAN, J. Electron. Mater. 16 (1987) 389.

    Google Scholar 

  5. Ch. KRONTIRAS, K. POMONI, and M. ROILOS, J. Phys. D: Appl. Phys. 21 (1988) 509.

    Google Scholar 

  6. K. Y. AHN, T. H. DISTEFANO, N. J. MAZZEO, S. R. HERD, and K. N. TU, J. Appl. Phys. 53 (1982) 3777.

    Google Scholar 

  7. C. A. DIMITRIADIS, J. H. WERNER, S. LOGOTHETIDIS, M. STUTZ MANN, J. WEBER and R. NESPER, ibid. J.Appl. Phys. 68 (1990) 1726.

  8. M. C. BOST and J. E. MAHAN, ibid. J.Appl. Phys. 58 (1985) 2696.

    Google Scholar 

  9. U. BIRKHOLZ, and J. SCHELM, Phys. Status Solidi 34 (1969) K177.

    Google Scholar 

  10. H. P. GESERICH, S. K. SHARMA, and W. A. THEINER, Phil. Mag. 27 (1973) 101.

    Google Scholar 

  11. U. BIRKHOLZ, and J. SCHELM, Phys. Status Solidi 27 (1968) 27.

    Google Scholar 

  12. A. RIZZI, H. MORITZ, and H. LUTH, J. Vac. Sci. Technol. A9 (1991) 912.

    Google Scholar 

  13. Q.-G. ZHU, H. IWASAKI, E. D. WILLIAMS, and R. L. PARK, J. Appl. Phys. 60 (1986) 2629.

    Google Scholar 

  14. J. M. GALLEGO and R. MIRANDA, ibid. J. Appl. Phys. 69 (1991) 1377.

    Google Scholar 

  15. H. C. CHENG, T. R. YEW and L. J. CHEN, ibid. J. Appl. Phys. 57 (1985) 5246.

    Google Scholar 

  16. S. S. LAU, J. S.-Y. FENG, J. O. OLOWOLAFE, and M.-A. NICOLET, Thin Solid Films 25 (1975) 415.

    Google Scholar 

  17. N. CHERIEF, C. D'ANTERROCHES, R. C. CINTI, T. A. Nguyen TAN, and J. DERRIEN, Appl. Phys. Lett. 55 (1989) 1671.

    Google Scholar 

  18. C. A. DIMITRIADIS, and J. H. WERNER, J. Appl Phys. 68 (1990) 94.

    Google Scholar 

  19. J. E. MAHAN, K. M. GEIB, G. Y. ROBINSON, R. G. LONG, Y. XINGHUA, G. BAI, M. A. NICOLET, and M. NATHAN, Appl. Phys. Lett. 56 (1990) 2126.

    Google Scholar 

  20. S. Y. LEE, R. E. HUMMEL, and R. T. DEHOFF, Thin Solid Films 149 (1987) 29.

    Google Scholar 

  21. R. E. HUMMEL, R. T. DEHOFF, S. MATTS-GOHO and W. M. GOHO, ibid. Thin Solid Films 78 (1981) 1.

  22. M. L. GIMPL, A. D. MCMASTER, and N. FUSCHILLO, J. Appl. Phys. 35 (1964) 3572.

    Google Scholar 

  23. W. M. KANE, J. P. SPRATT and L. W. HERSHINGER, ibid. J. Appl. Phys. 37 (1966) 2085.

  24. S. K. SHARMA, and J. SPITZ, Thin Solid Films 65 (1980) 339.

    Google Scholar 

  25. Idem, S. K. SHARMA and J. SPITZ ibid. Thin Solid Films 66 (1980) L51.

  26. N. L. WU, and J. PHILLIPS, J. Appl. Phys. 59 (1986) 769.

    Google Scholar 

  27. A. K. SINHA, R. B. MARCUS, T. T. SHENG and S. E. HASZKO, ibid. J. Appl. Phys. 43 (1972) 3673.

    Google Scholar 

  28. C. M. KENNEFICKAND R. RAJ, Acta Metall. 37 (1989)2947.

    Google Scholar 

  29. D. J. SROLOVITZ, and S. A. SAFRAN, J. Appl. Phys. 60 (1986) 247.

    Google Scholar 

  30. E. JIRAN, and C. V. THOMPSON, J. Electron. Mater. 19 (1990) 1153.

    Google Scholar 

  31. K. T. MILLER, and F. F. LANGE, J. Mater. Res. 5 (1990) 151.

    Google Scholar 

  32. D. J. SROLOVITZ, and S. A. SAFRAN, J. Appl. Phys. 60 (1986) 255.

    Google Scholar 

  33. Lord RAYLEIGH, Proc. London Math. Soc. 10 (1878) 4.

    Google Scholar 

  34. F. A. NICHOLS, and W. W. MULLINS, Trans. Metal. Soc. AIME 233 (1965) 1840.

    Google Scholar 

  35. W. W. MULLINS, J. Appl. Phys. 30 (1959) 77.

    Google Scholar 

  36. G. L. J. BAILEY, and H. C. WATKINS, Proc. Phys. Soc. B 63 (1950) 350.

    Google Scholar 

  37. B. CHALMERS, R. KING, and R. SHUTTLEWORTH, Proc. Roy. Soc. A 193 (1948) 465.

    Google Scholar 

  38. H. L. CASWELL, and Y. BUDO, J. Appl. Phys. 35 (1963) 644.

    Google Scholar 

  39. D. G. IVEY, and G. R. PIERCY, J. Electron. Microsc. Tech. 8 (1988) 233.

    Google Scholar 

  40. H. C. CHENG, L. J. CHEN, and Y. R. YOUR, Mater. Res. Soc. Symp. Proc. 25 (1984) 441.

    Google Scholar 

  41. H. C. CHENG, T. R. YEW, and L. J. CHEN, Appl. Phys. Lett. 47 (1985) 128.

    Google Scholar 

  42. S. KENNOU, N. CHERIEF, R. C. CINTI, and T. A. Nguyen TAN, Surf. Sci. 211/212 (1989) 685.

    Google Scholar 

  43. T. D. HUNT, K. J. REESON, R. M. GWILLIAM, K. P. HOMEWOOD, R. J. WILSON, R. S. Spraggs, B. J. SEALY, C. D. MEEKISON, G. R. BOOKER, and P. OBERSCHACHTSIEK, Mater. Res. Soc. Symp. Proc. 260 (1992) 239.

    Google Scholar 

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Authors and Affiliations

  1. Department of Electrical Engineering, University of Alberta, T6G 2G6, Edmonton, Alberta, Canada

    D. Snell & D. G. Ivey

  2. Departments of Mining, Metallurgical and Petroleum Engineering, University of Alberta, T6G 2G6, Edmonton, Alberta, Canada

    D. G. Ivey

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  1. D. Snell
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  2. D. G. Ivey
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Snell, D., Ivey, D.G. Agglomeration problems in the formation of FeSi2 from Fe-Si thin-film couples. J Mater Sci: Mater Electron 4, 47–54 (1993). https://doi.org/10.1007/BF00226633

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