Abstract
This paper is a review of the incorporation and behaviour of carbon in group III–V materials. Both vapour phase epitaxy and growth in ultra high-vacuum environments are covered. Particular attention is given to the factors which influence the carbon-uptake rate such as the growth temperature, ratio of group V to group III materials and parasitic interaction with other species at the growth front. Among the latter, the role of hydrogen is crucial not only to the understanding of the incorporation of carbon but also to its behaviour in the lattice. Consequently, this issue is thoroughly discussed for both growth methods. Potential sources for the introduction of carbon to the growth front are also compared in the light of their utility for obtaining high well-confined acceptor profiles, such as are required in the latest-generation electronic and photonic devices. Finally, the material quality and dopant stability which can be obtained with carbon-doped materials will be briefly reviewed and, where possible, contrasted with that which can be obtained with other p-type dopants.
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Abernathy, C.R., Hobson, W.S. Carbon-impurity incorporation during the growth of epitaxial group III–V materials. J Mater Sci: Mater Electron 7, 1–21 (1996). https://doi.org/10.1007/BF00194087
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DOI: https://doi.org/10.1007/BF00194087