Enhanced removal of X-ray-induced carbon contamination using radio-frequency Ar/H2 plasma
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Removal of X-ray-induced carbon contamination on beamline optics was studied using radio-frequency plasma with an argon/hydrogen (Ar/H2) mixture. Experiments demonstrated that the carbon removal rate with Ar/H2 plasma was higher than that with pure hydrogen or argon. The possible mechanism for this enhanced removal was discussed. The key working parameters for Ar/H2 plasma removal were determined, including the optimal vacuum pressure, gas mixing ratio, and source power. The optimal process was performed on a carbon-coated multilayer, and the reflectivity was recovered.
KeywordsRadio-frequency plasma X-ray irradiation Carbon contamination
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