Acta Metallurgica Sinica (English Letters)

, Volume 27, Issue 6, pp 1046–1056 | Cite as

Corrosion Behavior of Ni–20Cr–18W–1Mo Superalloy in Supercritical Water

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Abstract

The corrosion behavior of Ni–20Cr–18 W–1Mo superalloy in supercritical water 500 °C/25 MPa for 200 h is investigated using gravimetry, SEM/EDS, XPS, and TEM. The oxide films show a layered structure with Ni rich in the outer layer, and Cr rich in the inner layer, consisting of an outer Ni(OH)2 and NiO layer, including some Cr(OH)3, and an inner Cr2O3, NiCr2O4, and WO3 layer. Mo elements are not oxidized. The oxide films grow via a mixed mechanism, namely metal dissolution/oxide precipitation mechanism and solid-state growth mechanism. The effects of secondary and primary carbides on the weight-gain trend and oxide formation are discussed.

Keywords

Ni–20Cr–18 W–1Mo Corrosion behavior Corrosion mechanism Supercritical water Oxide film 
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Notes

Acknowledgments

The authors are grateful to the financial support from the project supported by Research Fund of the State Key Laboratory of Solidification Processing, China (No. 62-TP-2011) and 111 project (No. B08040).

References

  1. [1]
    G.S. Was, P. Ampornrat, G. Gupta, S. Teysseyre, E.A. West, T.R. Allen, K. Sridharan, L. Tan, Y. Chen, X. Ren, C. Pister, J. Nucl. Mater. 371, 176 (2007)CrossRefGoogle Scholar
  2. [2]
    C. Sun, R. Hui, W. Qu, S. Yick, Corros. Sci. 51, 2508 (2009)CrossRefGoogle Scholar
  3. [3]
    Q. Zhang, R. Tang, K. Yin, X. Luo, L.F. Zhang, Corros. Sci. 51, 2092 (2009)CrossRefGoogle Scholar
  4. [4]
    L. Tan, X. Ren, K. Sridharan, T.R. Allen, Corros. Sci. 50, 3056 (2008)CrossRefGoogle Scholar
  5. [5]
    M. Casales, V.M. Salinas-Bravo, A. Martinez-Villafañe, J.G. Gonzalez-Rodriguez, Mater. Sci. Eng. A 332, 223 (2002)CrossRefGoogle Scholar
  6. [6]
    T. Angeliu, G. Was, Mater. Trans. A 21, 2097 (1990)CrossRefGoogle Scholar
  7. [7]
    G. Sui, J.M. Titchmarsh, G.B. Heys, J. Congleton, Corros. Sci. 39, 565 (1997)CrossRefGoogle Scholar
  8. [8]
    Y.S. Lim, H.P. Kim, J.H. Han, J.S. Kim, H.S. Kwon, Corros. Sci. 43, 1321 (2001)CrossRefGoogle Scholar
  9. [9]
    Y. Lim, J. Suh, J. Kim, I. Kuk, Mater. Trans. A 28, 1223 (1997)CrossRefGoogle Scholar
  10. [10]
    Y.S. Lim, J.S. Kim, H.S. Kwon, J. Nucl. Mater. 336, 65 (2005)CrossRefGoogle Scholar
  11. [11]
    S. Xu, X. Wu, E.H. Han, W. Ke, Y. Katada, Mater. Sci. Eng. A 490, 16 (2008)CrossRefGoogle Scholar
  12. [12]
    F. Meng, J. Wang, E.H. Han, W. Ke, Corros. Sci. 52, 927 (2010)CrossRefGoogle Scholar
  13. [13]
    X. Ren, K. Sridharan, T.R. Allen, Corrosion 63, 603 (2007)CrossRefGoogle Scholar
  14. [14]
    X. Zhong, E.-H. Han, X. Wu, Corros. Sci. 66, 369 (2013)CrossRefGoogle Scholar
  15. [15]
    R. Hu, G.H. Bai, J.S. Li, J.Q. Zhang, T.B. Zhang, H.Z. Fu, Mater. Sci. Eng. A 548, 83 (2012)CrossRefGoogle Scholar
  16. [16]
    G. Bai, R. Hu, J. Li, H. Zhong, H. Kou, H. Fu, Rare. Met. Mater. Eng. 38, 169 (2009). (in Chinese)Google Scholar
  17. [17]
    G.H. Bai, J.S. Li, R. Hu, T.B. Zhang, H.C. Kou, H.Z. Fu, Mater. Sci. Eng. A 528, 2339 (2011)CrossRefGoogle Scholar
  18. [18]
    A. V. Naumkin, A. Kraut-Vass, S. W. Gaarenstroom, C. J. Powell, NIST X-ray Photoelectron Spectroscopy Database, NIST Standard Reference Database 20, Version 4.1, USA, 2012Google Scholar
  19. [19]
    H. Sun, X. Wu, E.-H. Han, Corros. Sci. 51, 2840 (2009)CrossRefGoogle Scholar
  20. [20]
    H. Sun, X. Wu, E.-H. Han, Corros. Sci. 51, 2565 (2009)CrossRefGoogle Scholar
  21. [21]
    A. Machet, A. Galtayries, S. Zanna, L. Klein, V. Maurice, P. Jolivet, M. Foucault, P. Combrade, P. Scott, P. Marcus, Electrochim. Acta 49, 3957 (2004)CrossRefGoogle Scholar
  22. [22]
    T.M. Angeliu, G.S. Was, J. Electrochem. Soc. 140, 1877 (1993)CrossRefGoogle Scholar
  23. [23]
    J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben, Handbook X-ray Photoelectron Sprectroscopy (Perkin-Elmer, Eden Prairie, 1992)Google Scholar
  24. [24]
    BE Lookup Table for Signal from Elements and Common Chemical, XPS International, Inc. 1999Google Scholar
  25. [25]
    M. Sennour, L. Marchetti, F. Martin, S. Perrin, R. Molin, M. Pijolat, J. Nucl. Mater. 402, 147 (2010)CrossRefGoogle Scholar
  26. [26]
    Y. Yi, B. Lee, S. Kim, J. Jang, Mater. Sci. Eng. A 429, 161 (2006)CrossRefGoogle Scholar
  27. [27]
    M.C. Sun, X.Q. Wu, Z.E. Zhang, E.H. Han, J. Supercrit. Fluids 47, 309 (2008)CrossRefGoogle Scholar
  28. [28]
    X. Gao, X.Q. Wu, Z.E. Zhang, H. Guan, E.H. Han, J. Supercrit. Fluids 42, 157 (2007)CrossRefGoogle Scholar
  29. [29]
    R.E. Lobnig, H.P. Schmidt, K. Hennesen, H.J. Grabke, Oxid. Met. 37, 81 (1992)CrossRefGoogle Scholar
  30. [30]
    N.S. Mcintyre, D.G. Zetaruk, D. Owen, J. Electrochem. Soc. 126, 750 (1979)CrossRefGoogle Scholar
  31. [31]
    Q. Wu, H. Song, R.W. Swindeman, J.P. Shingledecker, V.K. Vasudevan, Metall. Mater. Trans. A 39, 2569 (2008)CrossRefGoogle Scholar
  32. [32]
    J.Q. Zhang, R. Hu, J. Wang, J.S. Li, J. Inno, Technol. Explor. Eng. 3, 48 (2013)Google Scholar
  33. [33]
    R. Bès, S. Gavarini, N. Millard-Pinard, S. Cardinal, A. Perrat-Mabilon, C. Peaucelle, T. Douillard, J. Nucl. Mater. 427, 415 (2012)CrossRefGoogle Scholar
  34. [34]
    M. Gillet, K. Mašek, C. Lemire, Thin Solid Films 444, 9 (2003)CrossRefGoogle Scholar
  35. [35]
    F. Czerwinski, J.A. Szpunar, Acta Mater. 46, 1403 (1998)CrossRefGoogle Scholar
  36. [36]
    P. Marikar, M.B. Brodsky, C.H. Sowers, N.J. Zaluzec, Ultramicroscopy 29, 247 (1989)CrossRefGoogle Scholar
  37. [37]
    B. Bennett, H.W. Pickering, Metall. Mater. Trans. A 18, 1117 (1987)CrossRefGoogle Scholar

Copyright information

© The Chinese Society for Metals and Springer-Verlag Berlin Heidelberg 2014

Authors and Affiliations

  1. 1.State Key Laboratory of Solidification ProcessingNorthwestern Polytechnical UniversityXi’anChina

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