Indian Journal of Physics

, Volume 84, Issue 10, pp 1399–1404 | Cite as

Observation of grain growth in swift heavy ion irradiated NiO thin films

  • P. Mallick
  • Chandana Rath
  • J. K. Dash
  • R. Biswal
  • D. C. Agarwal
  • D. Behera
  • D. K. Avasthi
  • D. Kanjilal
  • P. V. Satyam
  • N. C. Mishra
Article

Abstract

NiO thin films grown on Si(100) substrates by electron beam evaporation, were sintered at 500 °C and 700 °C. The films were irradiated with 120 MeV Au9+ ions. Irradiation had different effects depending upon the initial microstructure of the films. Irradiation of the films at a fluence of 3 × 1011 ions cm−2 leads to grain growth for the films sintered at 500 °C and grain fragmentation for the films sintered at 700 °C. At still higher fluences of irradiation, grain size in 500 °C sintered film decreased, but the same improved in 700 °C sintered film. Associated with the grain size, texturing of the films was also shown to undergo significant modifications under irradiation.

Keywords

Ion Irradiation nanoparticles electronic excitation grain growth texturing NiO 

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References

  1. [1]
    R L Fleischer, P B Price and R M Walker J. Appl. Phys. 36 3645 (1965)CrossRefADSGoogle Scholar
  2. [2]
    S Chandramohan, R Sathyamoorthy, P Sudhagar, D Kanjilal, D Kabiraj, K Asokan and V Ganesan J. Mater Sci: Mater Electron 18 1093 (2007)CrossRefGoogle Scholar
  3. [3]
    P Mallick, D C Agarwal, Chandana Rath, R Biswal, D Behera, D K Avasthi, D Kanjilal, P V Satyam and N C Mishra Nucl. Instr. and Meth. B 266 3332 (2008)ADSGoogle Scholar
  4. [4]
    B Schattat, W Bolse, S Klaumunzer, I Zizak and R Scholz Appl. Phys. Lett. 87 173110 (2005)CrossRefADSGoogle Scholar
  5. [5]
    H L Chen, Y M Lu and W S Hwang Surf. Coat. Technol. 198 138 (2005)CrossRefGoogle Scholar
  6. [6]
    D Mohanta, S S Nath, A Bordoloi, A Choudhury, S K Dolui and N C Mishra J. Appl. Phys. 92 7149 (2002); D Mohanta, N C Mishra and A Choudhury Mater. Lett. 58 3694 (2004)CrossRefADSGoogle Scholar
  7. [7]
    D C Agarwal, A Kumar, S A Khan, D Kabiraj, F Singh, A Tripathi, J C Pivin, R S Chauhan and D K Avasthi Nucl. Instr. and Meth. B 244 136 (2006)ADSGoogle Scholar
  8. [8]
    R R Ahire, A A Sagade, N G Deshpande, S D Chavhan, R Sharma and F Singh J. Phys. D: Appl. Phys. 40 4850 (2007)CrossRefADSGoogle Scholar
  9. [9]
    S Furuno, H Otsu, K Hojou and K Izui Nucl. Instr. and Meth. B 107 223 (1996)ADSGoogle Scholar
  10. [10]
    T Mohanty, P V Satyam and D Kanjilal J. Nanosci. Nanotechnol. 6 1 (2006)Google Scholar

Copyright information

© Indian Association for the Cultivation of Science 2010

Authors and Affiliations

  • P. Mallick
    • 1
  • Chandana Rath
    • 2
  • J. K. Dash
    • 3
  • R. Biswal
    • 4
  • D. C. Agarwal
    • 5
  • D. Behera
    • 6
  • D. K. Avasthi
    • 5
  • D. Kanjilal
    • 5
  • P. V. Satyam
    • 3
  • N. C. Mishra
    • 4
  1. 1.Department of PhysicsNorth Orissa UniversityBaripadaIndia
  2. 2.School of Material Science & Technology, Institute of TechnologyBanaras Hindu UniversityVaranasiIndia
  3. 3.Institute of PhysicsBhubaneswarIndia
  4. 4.Department of PhysicsUtkal UniversityBhubaneswarIndia
  5. 5.Inter-University Accelerator CenterNew DelhiIndia
  6. 6.Department of PhysicsNational Institute of TechnologyRourkelaIndia

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