Indian Journal of Physics

, Volume 83, Issue 4, pp 493–502 | Cite as

Fundamental understanding and modeling of spin coating process: A review

  • Niranjan Sahu
  • B. Parija
  • S. Panigrahi


A mathematical model is derived to elucidate the dominant mechanism governing film formation. It leads to a relation between film thickness and film radius spreading with time. Inclusion of evaporation and shear stress was made with extension to non-Newtonian fluid. The advantages and disadvantages of this process with applications are reviewed.


Spin coating film thickness shear stress non-Newtonian fluids 


40 45.20.D, 47.50.-d, 68 68.55.-a, 68.55.jd 


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. [1]
    A G Emsile, F T Bonner and L G Peek J. Appl. Phys. 29 858 (1958)CrossRefADSMathSciNetGoogle Scholar
  2. [2]
    D Meyerhofer J. Appl. Phys. A9 3993 (1978)CrossRefADSGoogle Scholar
  3. [3]
    D E Bornside, C W Macosko et al, J. Imaging Tech. 13 122 (1987)Google Scholar
  4. [4]
    R K Yonkoski and D S Soane J. Appl. Phys. 72 725 (1992)CrossRefADSGoogle Scholar
  5. [5]
    C J Lawrence and W Zhou Journal of Non-Newtonian Fluid Mechanics 39 137 (1991)zbMATHCrossRefGoogle Scholar
  6. [6]
    S Middleman An Introduction to Fluid Dynamics (New York: John Wiley and Sons) (1998)Google Scholar
  7. [7]
    O Omar, A K Ray, A K Hassan and F Davis Supramolecular Science 4 417 (1997)CrossRefGoogle Scholar
  8. [8]
    W W Flack, D S Soong, A T Bell and D W Hess J. Appl. Phys. 56 1199 (1983)CrossRefADSGoogle Scholar
  9. [9]
  10. [10]

Copyright information

© Indian Association for the Cultivation of Science 2009

Authors and Affiliations

  1. 1.Department of PhysicsNational Institute of TechnologyRourkelaIndia

Personalised recommendations