Controlled airbrush coating of polymer resists in Roll-to-Roll nanoimprinting with regimented residual layer thickness

  • Sungkwan Koo
  • Sung Ho Lee
  • Jeong Dae Kim
  • Jung Goo Hong
  • Hyoung Won Baac
  • Moon Kyu Kwak
  • Jong G. Ok
Article

Abstract

We study the effective resist dispensing in continuous Roll-to-Roll (R2R) nanoimprinting system by using a simple and controlled airbrush coating method. Compared to common spin-coating or drop-casting, airbrushing can better afford the continuous coating operation required in a R2R nanoimprinting system with controlled thickness and uniformity. We use a UV-curable epoxysilsesquioxane (SSQ) and propylene glycol methyl ether acetate (PGMEA) as a concentration control agent, which are airbrushed for a controlled time over a continuously fed flexible or rigid substrate in a R2R conveyer. The R2R nanoimprinting is successfully conducted with uniform pattern quality. By modulating the airbrushing time and resist concentration, the residual layer thickness (RLT) of R2R-imprinted patterns can be readily controlled for specific uses.

Keywords

Airbrush coating Nanoimprinting Roll-to-roll Residual layer thickness Continuous nanopatterning 

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Copyright information

© Korean Society for Precision Engineering and Springer-Verlag Berlin Heidelberg 2016

Authors and Affiliations

  • Sungkwan Koo
    • 1
  • Sung Ho Lee
    • 2
  • Jeong Dae Kim
    • 1
  • Jung Goo Hong
    • 2
  • Hyoung Won Baac
    • 3
  • Moon Kyu Kwak
    • 2
    • 4
  • Jong G. Ok
    • 1
  1. 1.Department of Mechanical and Automotive EngineeringSeoul National University of Science and TechnologySeoulSouth Korea
  2. 2.School of Mechanical EngineeringKyungpook National UniversityDaeguSouth Korea
  3. 3.School of Electronic and Electrical EngineeringSungkyunkwan UniversityGyeonggi-doSouth Korea
  4. 4.Research Center, Ncoretechnology, Co., Ltd.DaeguSouth Korea

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