Densely aligned graphene nanoribbons at ∼35 nm pitch
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We demonstrate the fabrication of high-density aligned graphene nanoribbon (GNR) arrays by plasma etching of graphene sheets through a nanomask derived from self-assembled poly (styrene-block-dimethylsiloxane) (PS-PDMS) diblock copolymer films. This approach produces parallel GNR (∼12 nm wide) arrays at ∼35 nm pitch. Microscopy and polarized Raman spectroscopy are used to reveal the high-degree of alignment of GNRs. Electrical measurements show that parallel GNRs in a 1 μm wide region can deliver ∼0.38 mA current at a source-drain bias of 1 V. This novel patterning approach allows for the fabrication of densely aligned GNR arrays on various substrates and could provide a route to large scale integration of GNRs into nanoelectronics, optoelectronics and biosensors.
KeywordsGraphene nanoribbons aligned array diblock copolymer plasma etching
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- Cano-Marquez, A. G.; Rodriguez-Macias, F. J.; Campos-Delgado, J.; Espinosa-Gonzalez, C. G.; Tristan-Lopez, F.; Ramirez-Gonzalez, D.; Cullen, D. A.; Smith, D. J.; Terrones, M.; Vega-Cantu, Y. I. Ex-MWNTs: Graphene sheets and ribbons produced by lithium intercalation and exfoliation of carbon nanotubes. Nano Lett. 2009, 9, 1527–1533.CrossRefGoogle Scholar
© Tsinghua University Press and Springer-Verlag Berlin Heidelberg 2012