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Anode oxidation of HCHO in THPED-containing electroless copper plating solution

  • Ya-jie Zheng (郑雅杰)Email author
  • Fa-xin Xiao (肖发新)
  • Wei-hong Zou (邹伟红)
  • Yong Wang (王 勇)
Article

Abstract

The electrochemical mechanism of anode oxidation of HCHO in electroless copper plating solution with N, N, N′, N′-tetrakis(2-hydroxypropyl)ethylenediamine (THPED) was investigated by measuring cyclic voltammetry curves and anodic polarization curves. Three different oxidation peaks occur at the potentials of −0.62 V (Peak 1), −0.40 V (Peak 2) and −0.17 V (Peak 3) in the anode oxidation process of THPED-containing solution. The reaction at Peak 1, a main oxidation reaction, is the irreversible reaction of adsorbed HCHO with hydrogen evolution. The reaction at Peak 2, a secondary oxidation reaction, is the quasi-reversible reaction of adsorbed HCHO without hydrogen evolution. The reaction at Peak 3 is the irreversible oxidation of anode copper. The current density of Peak 1 increases gradually, that of Peak 2 remains constant and that of Peak 3 decreases with the increase of HCHO concentration. The current density of Peak 3 increases with the increase of THPED concentration and the complexation of THPED promotes the dissolution of anode copper.

Key words

electroless copper plating anode oxidation THPED HCHO electrochemical mechanism 

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Copyright information

© Central South University Press and Springer-Verlag GmbH 2008

Authors and Affiliations

  • Ya-jie Zheng (郑雅杰)
    • 1
    Email author
  • Fa-xin Xiao (肖发新)
    • 1
    • 2
  • Wei-hong Zou (邹伟红)
    • 1
  • Yong Wang (王 勇)
    • 1
  1. 1.School of Metallurgical Science and EngineeringCentral South UniversityChangshaChina
  2. 2.School of Materials Science and EngineeringHenan University of Science and TechnologyLuoyangChina

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