Application of rapid thermal processing on SiNx thin film to solar cells

  • Youjie Li
  • Peiqing Luo
  • Zhibin Zhou
  • Rongqiang Cui
  • Jianhua Huang
  • Jingxiao Wang
Research Article

Abstract

Rapid thermal processing (RTP) of SiN x thin films from PECVD with low temperature was investigated. A special processing condition of this technique which could greatly increase the minority lifetime was found in the experiments. The processing mechanism and the application of the technique to silicon solar cells fabrication were discussed. A main achievement is an increase of the minority lifetime in silicon wafer with SiN x thin film by about 200% after the RTP was reached. PC-1Dsimulation results exhibit an enhancement of the efficiency of the solar cell by 0.42% coming from the minority lifetime improvement. The same experiment was also conducted with P-diffusion silicon wafers, but the increment of minority lifetime is just about 55%. It could be expected to improve the solar cell efficiency if it would be used in silicon solar cells fabrication with the combination of laser firing contact technique.

Keywords

SiNx thin films rapid thermal processing (RTP) laser firing contact (LFC) solar cells 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    Zhang Sudong. Research on the Thermal stability of SiNx thin films for back passivation. In: Feng Linghuan ed. 2006 New Photovoltaiic Developmnt in the China. Chengdu: North-west Jiaotong University Press, 2006, 746–749 (in Chinese)Google Scholar
  2. 2.
    Zha Chaolin. Research on the rapidly thermal diffusion characteres and the furnace. In: Yan Luguang ed. 21 Century New Soalar Technics. Shanghai: Shanghai Jiaotong University Press, 2003, 58–61 (in Chinese)Google Scholar
  3. 3.
    Wang Jingxiao. PC1Dsolar cell performance simulation software. In: Yan Luguang ed. 21 CenturyNew Soalar Technics. Shanghai: Shanghai Jiaotong University Press, 2003, 41–43 (in Chinese)Google Scholar
  4. 4.
    Chen Z, Pang S K, Yasutake K. Plasma-enhanced chemical-vapor-deposited oxide for low surface recombination velocity and high effective lifetime in silicon. Journal of Applied Physics, 1993, 74(4): 2856–2859CrossRefGoogle Scholar
  5. 5.
    Wieringen A C, Warmoltz N. On the permeation of hydrogen and helium in single crystal silicon and germanium at elevated temperatures. Physica, 1956, 22(6): 849–865CrossRefGoogle Scholar
  6. 6.
    Rohatgi A. Designs and fabrication technologies for future commercial crystalline Si solar Cells. In: Sopori B L, Kalejs J, eds. 15th Workshop on Crystalline Silicon Solar Cells and Modules: Materials and Processes. Colorado: Vail Cascade Resort, 2005, 11–22Google Scholar
  7. 7.
    Chen Fengxiang. Silicon Surfacece and bulk defect passivation by PECVD. Acta Energiae Solaris Sinica, 2003, 24(3): 348–351 (in Chinese)Google Scholar

Copyright information

© Higher Education Press and Springer-Verlag GmbH 2008

Authors and Affiliations

  • Youjie Li
    • 1
  • Peiqing Luo
    • 1
  • Zhibin Zhou
    • 1
  • Rongqiang Cui
    • 1
  • Jianhua Huang
    • 2
  • Jingxiao Wang
    • 2
  1. 1.Solar Energy InstituteShanghai Jiao Tong UniversityShanghaiChina
  2. 2.Photovoltaic D&R Center of LinyangShanghai Jiao Tong UniversityShanghaiChina

Personalised recommendations