Deposition of YSZ Coatings in a Chamber at Pressures below 100 Pa Using Low-Power Plasma Spraying with an Internal Injection Powder Feeding
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Abstract
By decreasing the chamber pressure, the effective mean free path length in a plasma jet increases, resulting in a distinct decrease in the heat transfer from the plasma jet to the powder feedstock. Thus, instantaneous, complete melting or partial evaporation of the powders in the plasma jet becomes difficult. To create yttria partially stabilized zirconia coatings in a relatively low-power plasma jet and a low-pressure environment of 100 Pa, a new plasma torch with a specialized nozzle with an internal injection powder system was designed. Optical emission spectroscopy indicated that the feedstock powder could be partially vaporized in a 700-A plasma arc in either 40Ar–10H2 or 20Ar–20He–10H2 standard liters per minute (SLPM) plasma gas. Denser coatings were deposited at arc current of 700 A by changing the plasma gas mixture from argon–hydrogen to argon–helium–hydrogen. A compact coating was obtained as the amount of vaporized powder increased, but the microstructure of the coating lost its columnar morphology due to the limited amount of vapor phase. In addition, the porosity and microhardness of the coatings were measured.
Keywords
coating optical emission spectroscopy very low-pressure plasma spraying yttria partially stabilized zirconiaNotes
Acknowledgments
This work was supported by the National Natural Science Foundation of China General Project Grant (No. 51172033). The authors are grateful for their support.
References
- 1.D. Yang, B. Tian, and Y. Gao, The Lamellar-Equiaxed Microstructural Transition of 316L Coatings by Low Pressure Plasma Spraying, Surf. Coat. Technol., 2013, 228, p S72-S76Google Scholar
- 2.Z. Salhi, D. Klein, P. Gougeon, and C. Coddet, Development of Coating by Thermal Plasma Spraying Under Very Low-Pressure Condition <1 mbar, Vacuum, 2005, 77, p 145-150CrossRefGoogle Scholar
- 3.K. von Niessen and M. Gindrat, Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor Phase, J. Therm. Spray Technol., 2011, 20(4), p 36-743CrossRefGoogle Scholar
- 4.A. Hospach, G. Mauer, R. Vaßen, and D. Stover, Columnar-Structured Thermal Barrier Coatings (TBCs) by Thin Film Low-Pressure Plasma Spraying (LPPS-TF), J. Therm. Spray Technol., 2011, 20, p 116-120CrossRefGoogle Scholar
- 5.A. Refke, M. Gindrat, K. von Niessen, and R. Damani, LPPS Thin Film: A Hybrid Coating Technology between Thermal Spray and PVD for Functional Thin Coatings and Large Area Applications, Thermal Spray 2007: Global Coating Solutions, B.R. Marple, M.M. Hyland, Y.-C. Lau, C.-J. Li, R.S. Lima, and G. Montavon, Eds., May 14-16, 2007 (Beijing), ASM International, Materials Park, 2007, p 705-710, on CD-ROMGoogle Scholar
- 6.A. Hospach, G. Mauer, R. Vaßen, and D. Stover, Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF), J. Therm. Spray Technol., 2012, 21(3-4), p 435-440CrossRefGoogle Scholar
- 7.L. Zhu, N. Zhang, F. Sun, R. Bolot, M.-P. Planche, H. Liao, and C. Coddet, Thin Yttria-Stabilized Zirconia Coatings Deposited by Low-Energy Plasma Spraying under Very Low Pressure Condition, J. Therm. Spray Technol., 2011, 20(5), p 1118-1124CrossRefGoogle Scholar
- 8.G. Mauer, R. Vaßen, and D. Stover, Thin and Dense Ceramic Coatings by Plasma Spraying at Very Low Pressure, J. Therm. Spray Technol., 2010, 19(1-2), p 495-501CrossRefGoogle Scholar
- 9.Y. Gao, M. De Yang, and J. Gao, Characteristics of a Plasma Torch Designed for Very Low Pressure Plasma Spraying, J. Therm. Spray Technol., 2012, 21(3-4), p 740-744CrossRefGoogle Scholar
- 10.A. Vardelle, M. Vardelle, H. Zhang, N.J. Themelis, and K. Gross, Volatilization of Metal Powders in Plasma Sprays, J. Therm. Spray Technol., 2002, 11(2), p 244-252CrossRefGoogle Scholar
- 11.N. Zhang, F. Sun, L. Zhu, M.P. Planche, H. Liao, C. Dong, and C. Coddet, Electron Temperature and Density of the Plasma Measured by Optical Emission Spectroscopy in VLPPS Conditions, J. Therm. Spray Technol., 2011, 20(6), p 1321-1327CrossRefGoogle Scholar
- 12.S. Janisson, A. Vardelle, J.F. Coudert, E. Meillot, B. Pateyron, and P. Fauchais, Plasma Spraying Using Ar-He-H2 Gas Mixtures, J. Therm. Spray Technol., 1999, 8, p 545-552CrossRefGoogle Scholar