Journal of Electronic Materials

, Volume 28, Issue 6, pp 756–759 | Cite as

Effect of incident angle in spectral ellipsometry on composition control during molecular beam epitaxial growth of HgCdTe

  • F. Aqariden
  • W. M. Duncan
  • H. D. Shih
  • L. A. Almeida
  • M. J. Bevan
Special Issue Paper

Abstract

The effect of incident angle in spectral ellipsometry (SE) on composition control of Hg1−xCdxTe grown by molecular beam epitaxy (MBE) was investigated. Although a small uncertainty in the incident angle tends to have a significant impact on the ellipsometric data, and therefore the composition data, it was found that the incident angle uncertainty could be corrected in the SE model calculation, resulting in an “optimized” incident angle that would give the best fit between measured and calculated ellipsometric data. Experimental data supporting this simple corrective or optimization procedure for the incident angle are presented.

Key words

HgCdTe in-situ growth molecular beam epitaxy (MBE) spectroscopic ellipsometry 

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References

  1. 1.
    Y. Demay, D. Arnoult, J.P. Gailliard and P. Medina, J. Vac. Sci. Technol. A 5, 3139 (1987).CrossRefGoogle Scholar
  2. 2.
    W.M. Duncan, M.J. Bevan and H.D. Shih, J. Vac. Sci. Technol. A 15, 216 (1997).CrossRefGoogle Scholar
  3. 3.
    L.A. Almeida, J.N. Johnson, J.D. Benson, J.H. Dinan and B. Johs, J. Electron. Mater. 27, 500 (1998).CrossRefGoogle Scholar
  4. 4.
    J.A. Roth, Mater. Res. Soc. Symp. Proc. 502, (Pittsburgh, PA: Mater. Res. Soc., 1998), p. 97.Google Scholar
  5. 5.
    S.D. Murthy, I. Bhat, B. Johs, S. Pittal and P. He, J. Electron. Mater. 24, 1087 (1995).Google Scholar
  6. 6.
    M.J. Bevan, W.M. Duncan, G.H. Westphal and H.D. Shih, J. Electron. Mater. 25, 1371 (1996).Google Scholar
  7. 7.
    M.J. Bevan, L.A. Almeida, W.M. Duncan and H.D. Shih, J. Electron. Mater. 26, 502 (1997).Google Scholar
  8. 8.
    L.A. Almeida, M.J. Bevan, W.M. Duncan and H.D. Shih, Mater. Res. Symp. Proc. 450, (Pittsburgh, PA: Mater. Res. Society, 1997), p. 269.Google Scholar
  9. 9.
    R. Dat, F. Aqariden, W.M. Duncan, D. Chandra and H.D. Shih, Mater. Res. Symp. Proc. 484, (Pittsburgh, PA: Mater. Res. Society, 1998), p. 377.Google Scholar
  10. 10.
    F. Aqariden, W.M. Duncan, H.D. Shih and P.K. Liao, to be published.Google Scholar

Copyright information

© TMS-The Minerals, Metals and Materials Society 1999

Authors and Affiliations

  • F. Aqariden
    • 1
    • 2
  • W. M. Duncan
    • 3
  • H. D. Shih
    • 1
  • L. A. Almeida
    • 4
  • M. J. Bevan
    • 5
  1. 1.DRS Infrared Technologies, L.P.Dallas
  2. 2.Microphysics LaboratoryUniversity of Illinois at ChicagoChicago
  3. 3.Texas Instruments IncorporatedDigital Imaging Technology DevelopmentPlano
  4. 4.E-OIR Measurements, Inc.Spotsylvania
  5. 5.Texas Instruments IncorporatedSilicon Technology DevelopmentDallas

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