Journal of Electronic Materials

, Volume 41, Issue 6, pp 1476–1480 | Cite as

New Layered Intergrowths in the Sn-Mo-Se System

  • M. Beekman
  • G. Cogburn
  • C. Heideman
  • S. Rouvimov
  • P. Zschack
  • W. Neumann
  • D.C. Johnson
Article

Abstract

Several new metastable layered intergrowths based on tin monoselenide and molybdenum diselenide, [(SnSe)1+δ ] m [MoSe2] n , have been prepared by self-assembly from elemental nanolaminate precursors deposited by physical vapor deposition. The thin-film specimens were characterized by laboratory x-ray reflectivity and diffraction, synchrotron x-ray diffraction, electron probe microanalysis, and scanning transmission electron microscopy techniques, all of which indicate the formation of intergrowths with precise layering and well-defined composition. Analysis of in-plane diffraction originating from the individual components yields a structural misfit of δ = 0.06 and suggests turbostratic misorientation of the individual layers. In contrast to most known [(MX)1+δ ] m [TX2] n -type chalcogenide compounds, electrical transport data for the [(SnSe)1+δ ]1[MoSe2]1 composition are consistent with semiconducting behavior.

Keywords

Thermoelectric intergrowth semiconductor synthesis novel materials thin film modulated elemental reactants 

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Copyright information

© TMS 2012

Authors and Affiliations

  • M. Beekman
    • 1
    • 4
  • G. Cogburn
    • 1
  • C. Heideman
    • 1
    • 5
  • S. Rouvimov
    • 2
  • P. Zschack
    • 3
  • W. Neumann
    • 1
  • D.C. Johnson
    • 1
  1. 1.Department of ChemistryUniversity of OregonEugeneUSA
  2. 2.Department of PhysicsPortland State UniversityPortlandUSA
  3. 3.Advanced Photon SourceArgonne National LabArgonneUSA
  4. 4.Department of Natural SciencesOregon Institute of TechnologyKlamath FallsUSA
  5. 5.Department of Chemistry and BiochemistryEastern Oregon UniversityLa GrandeUSA

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