Preparation and Characterization of CdTe for Solar Cells, Detectors, and Related Thin-Film Materials
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Cadmium telluride (CdTe) thin films were prepared by the close-space sublimation (CSS) technique, using 99.99% pure CdTe powder as the evaporant. Films were then annealed at 400°C for 30 min and were later dipped in Cu(NO3)2-H2O solution at 80 ± 2°C. After immersion these films were again annealed at 400°C for 1 h to ensure the Cu diffusion into the films. X-ray diffraction (XRD) results confirmed the formation of a new compound copper telluride and a change in the morphology was observed by scanning electron microscopy (SEM). The DC electrical resistivity reduced from 106 Ω-cm for as-deposited to 10−3 Ω-cm for 15 h immersed film. As the wt.% of Cu increased, the mobility increased to some extent, while the carrier concentration showed a systematic increase. The film thickness and optical parameter such as refractive index, absorption coefficient, and the optical band gap were deduced by fitting the optical transmittance in the wavelength range 300 to 3000 nm. The transmission decreased with increasing immersion time of films in the␣solution. The Cu concentration was recorded as 0.9 wt.% for 3 min to 56.6 wt.% for 15 h immersed samples using an electron microprobe analyzer (EMPA). In the next step, ITO/CdS/CdTe heterojunctions with 10.9% solar cell efficiency were fabricated on glass slides.
Keywords
Copper doping optical properties semiconductor thin filmsPreview
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Acknowledgements
This work was supported by Pakistan Science Foundation Project No. PSF C-QU/phys (121) and a project of the Higher Education Commission of Pakistan. The authors would like to thank Dr. A.K.S. Aqili, Dr. Zulfiqar Ali, Rana M. Ajmal, and Dr. Anis-Ur-Rahman for their valuable discussions about this work.
References
- 1.D. Rioux, D.W. Niles, H. Hochst, J. Appl. Phys. 73, 8381 (1993)CrossRefGoogle Scholar
- 2.T.A. Gessert and T.J. Coutts (Proceedings of the 12th Nrel Photovoltaic Program Review, 1993), p. 345Google Scholar
- 3.T.A. Gessert, A.R. Mason, R.C. Reedy, R. Maston, T.J. Cutts, P. Sheldon, J. Electron. Mater. 24, 1443 (1995)CrossRefGoogle Scholar
- 4.J. Tang, D. Mao, L. Feng, W. Song, and J.U. Trefny (Proceedings of the 25th PVSC, Washington, DC, May 1996), p. 952Google Scholar
- 5.L. Feng, D. Mao, J. Tang, R.T. Culins, J.U. Trenfny, J. Electron. Mater. 5, 1442 (1996)Google Scholar
- 6.X. Wu, J.C. Keane, R.G. Dhere, C. Dehart, D.S. Albin, A.␣Duda, T.A. Gessert, S. Asher, D.H. Levi, and P. Sheldon (Munich, Germany Seventeenth European Photovoltaic Solar Energy Conference Proceedings of the International Conference, 2001), vol. 1, p. 995Google Scholar
- 7.H. Wolf, T. Filz, V. Ostheimer, J. Hamann, S. Lany, J.Cryst.Growth 214/215, 967 (2000)CrossRefGoogle Scholar
- 8.H.H. Woodbury, M. Aven, J. Appl. Phys. 39, 5485 (1968)CrossRefGoogle Scholar
- 9.B.O. Wartlick, C. Blanchard, J.F. Barbot, Mater. Sci. Eng. B71, 254 (2000)CrossRefGoogle Scholar
- 10.I. Lyubomirsky, V. Lyakhovitskaya, R. Triboulet, D. Cahen, J. Electron. Mater. 26, 97 (1997)CrossRefGoogle Scholar
- 11.H. Wolf, F. Wagner, Th. Wichert, and ISOLDE Collaboration, Physica B 340–342, 275 (2003)Google Scholar
- 12.H. Wolf, F. Wagner, Th. Wichert, and ISOLDE collaboration, Defect Diffus Forum 237–240, 491 (2005)Google Scholar
- 13.X.L. Saldana, C. Vasquez-Lopez, A. Zehe, H. Navarro, R. Triboulet, Appl. Phys. Lett. 39, 433 (1981)CrossRefGoogle Scholar
- 14.G. Landwehr, A. Waag, K. Hoffmann, and R.N. Bicknell-Tassius (Proc. SPIE, 1991), vol. 1362, p. 382Google Scholar
- 15.T. Takahashi, et al., Nucl. Instrum. Methods 436, 111 (1999)CrossRefGoogle Scholar
- 16.C.S. Ferekides, D. Marinskiy, V. Viswanahan, B. Tetali, V. Palekis, P. Selvaraj, D.L. Morel, Thin Solid Films 361–362, 520 (2000)CrossRefGoogle Scholar
- 17.A. Ali, N. Abbas Shah, A.K.S. Aqili, A. Maqsood, J. Semicond. Sci. Technol. 21, 1296 (2006)CrossRefGoogle Scholar
- 18.N. Nakayama, H. Matsumoto, A. Nakano, S. Ikegami, H. Uda, T. Yamashita, Jpn. J. Appl. Phys. 19, 703 (1980)CrossRefGoogle Scholar
- 19.A. Ali, N. Abbas Shah, A.K.S. Aqili, A. Maqsood, Crystal Growth Design 6, 2149 (2006)CrossRefGoogle Scholar
- 20.N. EI-Kadry, M.F. Ahmed, K. Abdel Hady, Thin Solid Films 274, 120 (1996)CrossRefGoogle Scholar
- 21.N. Abbas Shah, A. Ali, Z. Ali, A. Maqsood, A.K.S. Aqili, J. Cryst.Growth 290, 452 (2006)CrossRefGoogle Scholar
- 22.N. Abbas Shah, A. Ali, Z. Ali, A.K.S. Aqili, A. Maqsood, J. Cryst.Growth 284, 477 (2005)CrossRefGoogle Scholar
- 23.A. Picos-Vega, M. Becerril, O. Zelaya-Angel, R. Ramirez-Bon, F.J. Espinoza-Beltran, J. Gonzalez-Hemandez, S. Jimenez-Sandoal, B. Chao, J. Appl. Phys. 83, 760 (1998)CrossRefGoogle Scholar
- 24.A.K.S. Aqili, A. Maqsood, Z. Ali, J. Appl. Surf. Sci 191, 280 (2002)CrossRefGoogle Scholar
- 25.J.C. Manifacier, P.M. Demuriac, J.P. Fillards, L. Voicario, Thin Solid Films 41, 127 (1977)CrossRefGoogle Scholar
- 26.R. Swanepoel, J. Phys. E. Sci. Instrum 16, 1214 (1983)CrossRefGoogle Scholar
- 27.D.K. Schroder, Semiconductor Material Device Characterization, 2nd ed. (New York: Wiley, 1998)Google Scholar
- 28.R.M. Rose, L.A. Shepard, and J. Wulff, The Structure and Properties of Materials (New York: John Wiley and Sons, Inc., 1967), vol. 4Google Scholar
- 29.P.D. Brown, Y.Y. Loginov, J.T. Mullins, T. Taguchi, K. Durose, J. Crystal Growth 117, 536 (1992)CrossRefGoogle Scholar
- 30.H.C. Chou, A. Rohatgi, J. Electron. Mater. 23, 31 (1994)CrossRefGoogle Scholar
- 31.Y.S. Tyan and E.A. Perez-Albuerne (Conference Record of the 16th IEEE Photovoltaic Specialists Conference, 1982), p. 794Google Scholar
- 32.S.P. Albright, J.F. Jordan, B. Ackerman, R.B. Chamberlin, Sol. Cells 27, 77 (1989)CrossRefGoogle Scholar