Comparison of GaN and In0.04Ga0.96N p-Layers on the Electrical and Electroluminescence Properties of Green Light Emitting Diodes
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We have compared the effects of Mg-doped GaN and In0.04Ga0.96N layers on the electrical and electroluminescence (EL) properties of the green light emitting diodes (LEDs). To investigate the effects of different p-layers on the LED performance, the diode active region structures were kept identical. For LEDs with p-InGaN layers, the p-In0.04Ga0.96N/GaN polarization-related EL peak was dominant at low current levels, while the multiple-quantum-well (MQW) peak became dominant at higher current levels, different from LEDs with p-GaN layers. Also, LEDs with p-InGaN exhibited slightly higher turn on voltages (V on ) and forward voltages (V f ) compared to LEDs with p-GaN layers. However, the MQW related EL intensity was much higher and diode series resistance lower for LEDs with p-InGaN layers compared with LEDs with p-GaN, showing possible improvements in output power for LEDs with p-InGaN layers. The diodes with p-GaN layers typically showed V f of ∼3.1 V at a drive current of 20 mA, with a series resistance of ∼24.7 Ω, while diodes with p-InGaN showed V f of ∼3.2 V, with a series resistance of ∼18.5 Ω, for device dimensions of 230 μm by 230 μm.
Keywords
Light emitting diode (LED) gallium nitride (GaN) metalorganic chemical vapor deposition (MOCVD) InGaNPreview
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References
- 1.M. Krames (2003 DOE Solid State Lighting Program Planning Workshop, Washington, DC, Nov. 13–14, 2003); http://www.netl.doe.gov/ssl/materials.html
- 2.F.A. Ponce, S. Srinivasan, A. Bell, L. Geng, R. Liu, M. Stevens, J. Cai, H. Omiya, H. Marui, S. Tanaka, Phys. Status Solidi B 240, 273 (2003)CrossRefGoogle Scholar
- 3.A. Hangleiter, J.S. Im, H. Colmer, S. Heppel, J. Off, S. Scholz, MRS Internet J. Nitride Semiconduct. Res. 3, 15 (1998)Google Scholar
- 4.M.D. McCluskey, L.T. Romano, B.S. Krusor, N.M. Johnson, T. Suski, J. Jun, Appl. Phys. Lett. 73, 1281 (1998)CrossRefGoogle Scholar
- 5.M.D. McCluskey, L.T. Romano, B.S. Krusor, D.P. Bohr, N.M. Johnson, S. Brennan, Appl. Phys. Lett. 72, 1730 (1998)CrossRefGoogle Scholar
- 6.C.C. Chou, C.M. Lee, J.I. Chyi, Appl. Phys. Lett. 78, 314 (2001)CrossRefGoogle Scholar
- 7.Wonseok Lee, Jae Limb, Jae-Hyun Ryou, Dongwon Yoo, Theodore Chung, Russell Dupuis, J. Cryst. Growth 287, 577 (2006)CrossRefGoogle Scholar
- 8.Wonseok Lee, Jae Limb, Jae-Hyun Ryou, Dongwon Yoo, Theodore Chung, Russell Dupuis, J. Electron. Mater. 35, 587 (2006)CrossRefGoogle Scholar
- 9.S. Kitamura, K. Hiramatsu, N. Sawaki, Jpn. J. Appl. Phys. 34, L184 (1995)CrossRefGoogle Scholar
- 10.Thomas Swan Scientific Equipment Ltd. Model 7 × 2 CCSGoogle Scholar
- 11.X.H. Wu, C.R. Elsass, A. Abare, M. Mack, S. Keller, P.M. Petroff, S.P. DenBaars, J.S. Speck, Appl. Phys. Lett. 72, 692 (1998)CrossRefGoogle Scholar
- 12.C. Wetzel, T. Salagaj, T. Detchprohm, P. Li, J.S. Nelson, Appl. Phys. Lett. 85, 866 (2004)CrossRefGoogle Scholar