Journal of Electronic Materials

, Volume 34, Issue 10, pp 1307–1309

Roughness and texture correlation of Al films

  • Wenjie Zhang
  • Leeward Yi
  • Juineng Tu
  • Pingyi Chang
  • Duli Mao
  • Jin Wu
Regular Issue Paper

Abstract

Titanium films prepared by standard direct-current (DC) magnetron physical vapor deposition (PVD) and ionized metal plasma PVD (I-PVD), with Al (0.5wt.%Cu) films on them, were studied. The surface roughness, reflectivity, and crystalline texture of Ti on SiO2/Si and Al on TiN/Ti/SiO2/Si were investigated with the same thickness of Al, TiN, and Ti. The surface roughness of Al films with Ti/TiN underlayers was found to be capable of monitoring Al(111) texture. So, the reflectivity of Al/TiN/Ti film stack can be used as a quick monitor for the electromigration (EM) lifetime.

Key words

Roughness texture electromigration 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    S. Vaidya and A.K. Sinha, Thin Solid Films 75, 253 (1981).CrossRefGoogle Scholar
  2. 2.
    Y.B. Park, D.W. Lee, H.H. Ryu, and W. Lee, J. Electron. Mater. 30, 1569 (2001).Google Scholar
  3. 3.
    Tsutomu Sasaki and Hitoshi Dohnomae, Jpn. J. Appl. Phys. 37, 6544 (1998).CrossRefGoogle Scholar
  4. 4.
    D.B. Knorr, S.M. Merchant, and M.A. Biberger, J. Vac. Sci. Technol. B 16, 2734 (1998).CrossRefGoogle Scholar
  5. 5.
    S. Li, Y.K. Lee, W. Gao, T. White, Z.L. Dong, and K. Maung Latt, J. Vac. Sci. Technol. B 19, 388 (2001).CrossRefGoogle Scholar
  6. 6.
    Won-Jun Lee, Sun-Jae Kim, and Wonhee Lee, J. Mater. Sci.-Mater. E 15, 9 (2004).CrossRefGoogle Scholar
  7. 7.
    C.V. Thompson, Annu. Rev. Mater. Sci. 30, 159 (2000).CrossRefGoogle Scholar
  8. 8.
    R. Jaiswal et al., Proc. Adv. Met. Conf. 735 (1999).Google Scholar

Copyright information

© TMS-The Minerals, Metals and Materials Society 2005

Authors and Affiliations

  • Wenjie Zhang
    • 1
    • 2
  • Leeward Yi
    • 1
    • 2
  • Juineng Tu
    • 3
  • Pingyi Chang
    • 3
  • Duli Mao
    • 3
  • Jin Wu
    • 3
  1. 1.Shanghai Institute of Microsystem and Information TechnologyChinese Academy of SciencesShanghaiChina
  2. 2.Graduate School of Chinese Academy of SciencesBeijingChina
  3. 3.Grace Semiconductor Manufacturing CorporationShanghaiChina

Personalised recommendations