Plasmonics

, Volume 11, Issue 5, pp 1337–1342 | Cite as

Surface plasmon-assisted nano-lithography with a perfect contact aluminum mask of a hexagonal dot array

Article
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Abstract

Surface plasmon lithography is potentially an alternative technique for high resolution patterning. However, implementation involves high cost and challenging fabrication steps. Here, we report nano-patterning assisted by surface plasmons with a perfectly contacted mask using colloidal lithography. A nano-scaled aluminum mask was fabricated using closed packed polystyrene spheres with a simple, fast, and low-cost method, and the loss of surface plasmon waves was reduced by the perfect contact between the mask and the photoresist. A photoresist pattern of two-dimensional hexagonal annular ring arrays was produced by illuminating light of 436 nm wavelength, and the width of the obtained annular ring was approximately λ/6. The simulation results showed that the proposed structure had a sufficiently high contrast value for lithography, and the fabrication patterns and the simulation results presented good agreement.

Keywords

Surface plasmon Photolithography Colloidal lithography 
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Notes

Acknowledgements

This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korean Government (MSIP) (No. NRF-2014R1A2A2A01005770).

Supplementary material

11468_2016_180_MOESM1_ESM.docx (759 kb)
ESM 1 (DOCX 758 kb)

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Copyright information

© Springer Science+Business Media New York 2016

Authors and Affiliations

  • Eun Sung Kim
    • 1
  • Yong Min Kim
    • 1
  • Kyung Cheol Choi
    • 1
  1. 1.Advanced Display & Nano Convergence LabSchool of Electrical Engineering, KAISTDaejeonKorea

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