Frontiers of Mechanical Engineering

, Volume 13, Issue 4, pp 493–503 | Cite as

Laser interference fabrication of large-area functional periodic structure surface

  • Lei Wang
  • Zi-Han Wang
  • Yan-Hao Yu
  • Hong-Bo Sun
Open Access
Review Article
Part of the following topical collections:
  1. Additive Manufacturing


Functional periodic structures have attracted significant interest due to their natural capabilities in regulating surface energy, surface effective refractive index, and diffraction. Several technologies are used for the fabrication of these functional structures. The laser interference technique in particular has received attention because of its simplicity, low cost, and high-efficiency fabrication of large-area, micro/nanometer-scale, and periodically patterned structures in air conditions. Here, we reviewed the work on laser interference fabrication of large-area functional periodic structures for antireflection, self-cleaning, and superhydrophobicity based on our past and current research. For the common cases, four-beam interference and multi-exposure of two-beam interference were emphasized for their setup, structure diversity, and various applications for antireflection, self-cleaning, and superhydrophobicity. The relations between multi-beam interference and multi-exposure of two-beam interference were compared theoretically and experimentally. Nanostructures as a template for growing nanocrystals were also shown to present future possible applications in surface chemical control. Perspectives on future directions and applications for laser interference were presented.


laser interference four-beam interference multi-exposure of two-beam interference additive fabrication 



H. B. Sun thanks the National Key Research and Development Program of China and the National Natural Science Foundation of China (Grant Nos. 2017YFB1104300, 61590930, 20150203008GX, and 61605055).


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Copyright information

© The Author(s) 2018

Open Access This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (, which permits unrestricted use, distribution, and reproduction in any medium, provided the appropriate credit is given to the original author(s) and the source, and a link is provided to the Creative Commons license, which indicates if changes are made.

Authors and Affiliations

  • Lei Wang
    • 1
  • Zi-Han Wang
    • 1
  • Yan-Hao Yu
    • 1
  • Hong-Bo Sun
    • 1
  1. 1.State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and EngineeringJilin UniversityChangchunChina

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