Development of two-dimensional materials for electronic applications

Review Special Focus on Advanced Microelectronics Technology

Abstract

Since the first report of promising electrical properties of Molybdenum disulfide (MoS2) transistors in 2011, two-dimensional materials with unique properties have attracted great attention, and much research on their applications has been carried out. MoS2 and black phosphorus are excellent candidates for advanced applications in future electronics because of their tunable bandgap, high carrier mobility, and ultra-thin bodies. In this review, recent research trends in the application of molybdenum disulfide and black phosphorus to electronic devices are examined. We mainly address mobility improvements, dielectrics engineering, radio frequency applications, and low-frequency noise, all of which are crucial for the development of electronic and optoelectronic devices.

Keywords

two-dimensional materials transistors dielectrics molybdenum disulfide black phosphorus 

基于二维材料的电子器件的研究进展

创新点

自从2011年基于单层硫化钼的晶体管成功制备开始,基于二维层状材料沟道的电子器件一直是国际学术界和工业界广泛关注的前沿热点,主要原因有两点:1.二维材料超薄体效应可以最大程度地抑制晶体管中的短沟道效应,在极限器件尺寸下,二维材料晶体管性能将有望超越硅基器件。2.二维材料具有高迁移率、能带可调控、各向异性等特点。本文介绍了近几年二硫化钼和黒磷的研究进展, 主要包括迁移率、高频器件、及低频噪声等方面的内容。

关键词

二维材料 晶体管 栅介质 二硫化钼 黒磷 

References

  1. 1.
    Xuan Y, Wu Y Q, Ye P D. High-performance inversion-type enhancement-mode InGaAs MOSFET with maximum drain current exceeding 1 A/mm. IEEE Electron Dev Lett, 2008, 29: 294–296CrossRefGoogle Scholar
  2. 2.
    Del Alamo J A. Nanometre-scale electronics with III-V compound semiconductors. Nature, 2011, 479: 317–323CrossRefGoogle Scholar
  3. 3.
    Zhang R, Huang P C, Lin J C, et al. High-mobility Ge p-and n-MOSFETs with 0.7-nm EOT using HfO2/Al2O3/GeOx/Ge gate stacks fabricated by plasma postoxidation. IEEE Trans Electron Dev, 2013, 60: 927–934CrossRefGoogle Scholar
  4. 4.
    Wu H, Si M W, Dong L, et al. Germanium nMOSFETs with recessed channel and S/D: contact, scalability, interface, and drain current exceeding 1 A/mm. IEEE Trans Electron Dev, 2015, 62: 1419–1426CrossRefGoogle Scholar
  5. 5.
    Schwierz F. Graphene transistors. Nat Nanotechnol, 2010, 5: 487–496CrossRefGoogle Scholar
  6. 6.
    Novoselov K S, Geim A K, Morozov S V, et al. Electric field effect in atomically thin carbon films. Science, 2004, 306: 666–669CrossRefGoogle Scholar
  7. 7.
    Geim A K, Novoselov K S. The rise of graphene. Nat Mater, 2007, 6: 183–191CrossRefGoogle Scholar
  8. 8.
    Koski K J, Cui Y. The new skinny in two-dimensional nanomaterials. ACS Nano, 2013, 7: 3739–3743CrossRefGoogle Scholar
  9. 9.
    Miro P, Audiffred M, Heine T. An atlas of two-dimensional materials. Chem Soc Rev, 2014, 43: 6537–6554CrossRefGoogle Scholar
  10. 10.
    Chhowalla M, Shin H S, Eda G, et al. The chemistry of two-dimensional layered transition metal dichalcogenide nanosheets. Nat Chem, 2013, 5: 263–275CrossRefGoogle Scholar
  11. 11.
    Radisavljevic B, Radenovic A, Brivio J, et al. Single-layer MoS2 transistors. Nat Nanotechnol, 2011, 6: 147–150CrossRefGoogle Scholar
  12. 12.
    Wang Q H, Kalantar-Zadeh K, Kis A, et al. Electronics and optoelectronics of two-dimensional transition metal dichalcogenides. Nat Nanotechnol, 2012, 7: 699–712CrossRefGoogle Scholar
  13. 13.
    Butler S Z, Hollen S M, Cao L, et al. Progress, challenges, and opportunities in two-dimensional materials beyond graphene. ACS Nano, 2013, 7: 2898–2926CrossRefGoogle Scholar
  14. 14.
    Ganatra R, Zhang Q. Few-Layer MoS2: a promising layered semiconductor. ACS Nano, 2014, 8: 4074–4099CrossRefGoogle Scholar
  15. 15.
    Li L K, Yu Y J, Ye G J, et al. Black phosphorus field-effect transistors. Nat Nanotechnol, 2014, 9: 372–377CrossRefGoogle Scholar
  16. 16.
    Liu H, Neal A T, Zhu Z, et al. Phosphorene: an unexplored 2D semiconductor with a high hole mobility. ACS Nano, 2014, 8: 4033–4041CrossRefGoogle Scholar
  17. 17.
    Du H W, Lin X, Xu Z M, et al. Recent developments in black phosphorus transistors. J Mater Chem C, 2015, 3: 8760–8775CrossRefGoogle Scholar
  18. 18.
    Tran V, Soklaski R, Liang Y, et al. Layer-controlled band gap and anisotropic excitons in few-layer black phosphorus. Phys Rev B, 2014, 89: 235319CrossRefGoogle Scholar
  19. 19.
    Ling X, Wang H, Huang S X, et al. The renaissance of black phosphorus. Proc Natl Acad Sci, 2015, 112: 4523–4530CrossRefGoogle Scholar
  20. 20.
    Santos E J G, Kaxiras E. Electric-field dependence of the effective dielectric constant in graphene. Nano Lett, 2013, 13: 898–902CrossRefGoogle Scholar
  21. 21.
    Mak K F, Lee C, Hone J, et al. Atomically thin MoS2: a new direct-gap semiconductor. Phys Rev Lett, 2010, 105: 136805CrossRefGoogle Scholar
  22. 22.
    Fiori G, Bonaccorso F, Iannaccone G, et al. Electronics based on two-dimensional materials. Nat Nanotechnol, 2014, 9: 768–779CrossRefGoogle Scholar
  23. 23.
    Jariwala D, Sangwan V K, Lauhon L J, et al. Emerging device applications for semiconducting two-dimensional transition metal dichalcogenides. ACS Nano, 2014, 8: 1102–1120CrossRefGoogle Scholar
  24. 24.
    Schwierz F, Pezoldt J, Granzner R. Two-dimensional materials and their prospects in transistor electronics. Nanoscale, 2015, 7: 8261–8283CrossRefGoogle Scholar
  25. 25.
    Yazyev O V, Kis A. MoS2 and semiconductors in the flatland. Mater Today, 2015, 18: 20–30CrossRefGoogle Scholar
  26. 26.
    Lopez-Sanchez O, Lembke D, Kayci M, et al. Ultrasensitive photodetectors based on monolayer MoS2. Nat Nanotechnol, 2013, 8: 497–501CrossRefGoogle Scholar
  27. 27.
    Radisavljevic B, Whitwick M B, Kis A. Integrated circuits and logic operations based on single-layer MoS2. ACS Nano, 2011, 5: 9934–9938CrossRefGoogle Scholar
  28. 28.
    Late D J, Huang Y-K, Liu B, et al. Sensing behavior of atomically thin-layered MoS2 transistors. ACS Nano, 2013, 7: 4879–4891CrossRefGoogle Scholar
  29. 29.
    Liu H, Neal A T, Ye P D. Channel length scaling of MoS2 MOSFETs. ACS Nano, 2012, 6: 8563–8569CrossRefGoogle Scholar
  30. 30.
    Du Y C, Yang L M, Liu H, et al. Contact research strategy for emerging molybdenum disulfide and other twodimensional field-effect transistors. APL Mater, 2014, 2: 092510CrossRefGoogle Scholar
  31. 31.
    Liu D, Guo Y, Fang L, et al. Sulfur vacancies in monolayer MoS2 and its electrical contacts. Appl Phys Lett, 2013Google Scholar
  32. 32.
    Das S, Chen H-Y, Penumatcha A V, et al. High performance multilayer MoS2 transistors with scandium contacts. Nano Lett, 2012, 13: 100–105CrossRefGoogle Scholar
  33. 33.
    Novoselov K S, Jiang D, Schedin F, et al. Two-dimensional atomic crystals. Proc Nat Acad Sci, 2005, 102: 10451–10453CrossRefGoogle Scholar
  34. 34.
    Radisavljevic B, Kis A. Mobility engineering and a metal–insulator transition in monolayer MoS2. Nat Mater, 2013, 12: 815–820CrossRefGoogle Scholar
  35. 35.
    Kaasbjerg K, Thygesen K S, Jacobsen KW. Phonon-limited mobility in n-type single-layer MoS2 from first principles. Physl Rev B, 2012, 85: 115317CrossRefGoogle Scholar
  36. 36.
    Kaasbjerg K, Thygesen K S, Jauho A-P. Acoustic phonon limited mobility in two-dimensional semiconductors: deformation potential and piezoelectric scattering in monolayer MoS2 from first principles. Phys Rev B, 2013, 87: 235312CrossRefGoogle Scholar
  37. 37.
    Jariwala D, Sangwan V K, Late D J, et al. Band-like transport in high mobility unencapsulated single-layer MoS2 transistors. Appl Phys Lett, 2013, 102: 173107CrossRefGoogle Scholar
  38. 38.
    Baugher B W H, Churchill H O H, Yang Y F, et al. Intrinsic electronic transport properties of high-quality monolayer and bilayer MoS2. Nano Lett, 2013, 13: 4212–4216CrossRefGoogle Scholar
  39. 39.
    Jena D, Konar A. Enhancement of carrier mobility in semiconductor nanostructures by dielectric engineering. Phys Rev Lett, 2007, 98: 136805CrossRefGoogle Scholar
  40. 40.
    Ma N, Jena D. Charge scattering and mobility in atomically thin semiconductors. Phys Rev X, 2014, 4: 011043Google Scholar
  41. 41.
    Zeng L, Xin Z, Chen S W, et al. Remote phonon and impurity screening effect of substrate and gate dielectric on electron dynamics in single layer MoS2. Appl Phys Lett, 2013, 103: 113505CrossRefGoogle Scholar
  42. 42.
    Singh A K, Hennig R G, Davydov A V, et al. Al2O3 as a suitable substrate and a dielectric layer for n-layer MoS2. Appl Phys Lett, 2015, 107: 053106CrossRefGoogle Scholar
  43. 43.
    Ong Z-Y, Fischetti M V. Mobility enhancement and temperature dependence in top-gated single-layer MoS2. Physl Rev B, 2013, 88: 165316CrossRefGoogle Scholar
  44. 44.
    Bao W Z, Cai X H, Kim D, et al. High mobility ambipolar MoS2 field-effect transistors: substrate and dielectric effects. Appl Phys Lett, 2013, 102: 042104CrossRefGoogle Scholar
  45. 45.
    Dean C, Young A, Meric I, et al. Boron nitride substrates for high-quality graphene electronics. Nat Nanotechnol, 2010, 5: 722–726CrossRefGoogle Scholar
  46. 46.
    Cui X, Lee G-H, Kim Y D, et al. Multi-terminal transport measurements of MoS2 using a van der Waals heterostructure device platform. Nat Nanotechnol, 2015, 10: 534–540CrossRefGoogle Scholar
  47. 47.
    Yoon Y, Ganapathi K, Salahuddin S. How good can monolayer MoS2 transistors be? Nano Lett, 2011, 11: 3768–3773CrossRefGoogle Scholar
  48. 48.
    Alam K, Lake R K. Monolayer MoS2 transistors beyond the technology road map. IEEE Trans Electron Dev, 2012, 59: 3250–3254CrossRefGoogle Scholar
  49. 49.
    Liu F, Wang Y, Liu X, et al. A theoretical investigation of orientation dependent transport in monolayer MoS2 transistors at the ballistic limit. IEEE Electron Dev Lett, 2015, 36: 1091–1093CrossRefGoogle Scholar
  50. 50.
    Liu L T, Lu Y, Guo J. On monolayer MoS2 field-effect transistors at the scaling limit. IEEE Trans Electron Dev, 2013, 60: 4133–4139CrossRefGoogle Scholar
  51. 51.
    Chang J, Register L F, Banerjee S K. Atomistic full-band simulations of monolayer MoS2 transistors. Appl Phys Lett, 2013, 103: 223509CrossRefGoogle Scholar
  52. 52.
    Yang L M, Majumdar K, Du Y C, et al. High-performance MoS2 field-effect transistors enabled by chloride doping: record low contact resistance (0.5 kohm* µm) and record high drain current (460 µA/µm). In: Proceedings of 2014 Symposium on VLSI Technology: Digest of Technical Papers, Honolulu, 2014. 192–193Google Scholar
  53. 53.
    Li X F, Yang L M, Si M W, et al. Performance potential and limit of MoS2 transistors. Adv Mater, 2015, 27: 1547–1552CrossRefGoogle Scholar
  54. 54.
    Wu Y Q, Farmer D B, Xia F N, et al. Graphene electronics: materials, devices, and circuits. Proc IEEE, 2013, 101: 1620–1637CrossRefGoogle Scholar
  55. 55.
    Wu Y Q, Lin Y-m, Bol A A, et al. High-frequency, scaled graphene transistors on diamond-like carbon. Nature, 2011, 472: 74–78CrossRefGoogle Scholar
  56. 56.
    Wu Y Q, Jenkins K A, Valdes-Garcia A, et al. State-of-the-art graphene high-frequency electronics. Nano Lett, 2012, 12: 3062–3067CrossRefGoogle Scholar
  57. 57.
    Wang H, Yu L L, Lee Y-H, et al. Large-scale 2D electronics based on single-layer MoS2 grown by chemical vapor deposition. In: Proceedings of the 2012 International Electron Devices Meeting, San Francisco, 2012. 4.6.1–4.6.4Google Scholar
  58. 58.
    Krasnozhon D, Lembke D, Nyffeler C, et al. MoS2 transistors operating at gigahertz frequencies. Nano Lett, 2014, 14: 5905–5911CrossRefGoogle Scholar
  59. 59.
    Cheng R, Jiang S, Chen Y, et al. Few-layer molybdenum disulfide transistors and circuits for high-speed flexible electronics. Nat Commun, 2014, 5: 5143CrossRefGoogle Scholar
  60. 60.
    Sanne A, Ghosh R, Rai A, et al. Radio frequency transistors and circuits based on CVD MoS2. Nano Lett, 2015, 15: 5039–5045CrossRefGoogle Scholar
  61. 61.
    Hooge F. 1/f noise sources. IEEE Trans Electron Dev, 1994, 41: 1926–1935CrossRefGoogle Scholar
  62. 62.
    Von Haartman M, Mikael S. Low-frequency Noise in Advanced MOS Devices. Berlin: Springer, 2007Google Scholar
  63. 63.
    Razavi B. A study of phase noise in CMOS oscillators. IEEE J Solid-State Circ, 1996, 31: 331–343CrossRefGoogle Scholar
  64. 64.
    Sangwan V K, Arnold H N, Jariwala D, et al. Low-frequency electronic noise in single-layer MoS2 transistors. Nano Lett, 2013, 13: 4351–4355CrossRefGoogle Scholar
  65. 65.
    Kwon H-J, Kang H, Jang J, et al. Analysis of flicker noise in two-dimensional multilayer MoS2 transistors. Appl Phys Lett, 2014, 104: 083110CrossRefGoogle Scholar
  66. 66.
    Renteria J, Samnakay R, Rumyantsev S L, et al. Low-frequency 1/f noise in MoS2 transistors: relative contributions of the channel and contacts. Appl Phys Lett, 2014, 104: 153104CrossRefGoogle Scholar
  67. 67.
    Rumyantsev S L, Jiang C L, Samnakay R, et al. 1/f noise characteristics of MoS2 thin-film transistors: comparison of single and multilayer structures. IEEE Electron Dev Lett, 2015, 36: 517–519CrossRefGoogle Scholar
  68. 68.
    Keyes R W. The electrical properties of black phosphorus. Phys Rev, 1953, 92: 580–584CrossRefGoogle Scholar
  69. 69.
    Morita A. Semiconducting black phosphorus. Appl Phys A, 1986, 39: 227–242CrossRefGoogle Scholar
  70. 70.
    Buscema M, Groenendijk D J, Blanter S I, et al. Fast and broadband photoresponse of few-layer black phosphorus field-effect transistors. Nano Lett, 2014, 14: 3347–3352CrossRefGoogle Scholar
  71. 71.
    Buscema M, Groenendijk D J, Steele G A, et al. Photovoltaic effect in few-layer black phosphorus PN junctions defined by local electrostatic gating. Nat Commun, 2014, 5: 4651CrossRefGoogle Scholar
  72. 72.
    Zhu W N, Yogeesh M N, Yang S X, et al. Flexible black phosphorus ambipolar transistors, circuits and AM demodulator. Nano Lett, 2015, 15: 1883–1890CrossRefGoogle Scholar
  73. 73.
    Fei R X, Yang L. Strain-engineering the anisotropic electrical conductance of few-layer black phosphorus. Nano Lett, 2014, 14: 2884–2889CrossRefGoogle Scholar
  74. 74.
    Hong T, Chamlagain B, Lin W Z, et al. Polarized photocurrent response in black phosphorus field-effect transistors. Nanoscale, 2014, 6: 8978–8983CrossRefGoogle Scholar
  75. 75.
    Ong Z-Y, Cai Y Q, Zhang G, et al. Strong thermal transport anisotropy and strain modulation in single-layer phosphorene. J Phys Chem C, 2014, 118: 25272–25277CrossRefGoogle Scholar
  76. 76.
    Ong Z-Y, Zhang G, Zhang Y W. Anisotropic charged impurity-limited carrier mobility in monolayer phosphorene. J Appl Phys, 2014, 116: 214505CrossRefGoogle Scholar
  77. 77.
    Qiao J S, Kong X H, Hu Z-X, et al. High-mobility transport anisotropy and linear dichroism in few-layer black phosphorus. Nat Commun, 2014, 5: 4475Google Scholar
  78. 78.
    Ge S F, Li C K, Zhang Z M, et al. Dynamical evolution of anisotropic response in black phosphorus under ultrafast photoexcitation. Nano Lett, 2015, 15: 4650–4656CrossRefGoogle Scholar
  79. 79.
    Jiang J-W. Thermal conduction in single-layer black phosphorus: highly anisotropic? Nanotechnology, 2015, 26: 055701CrossRefGoogle Scholar
  80. 80.
    Lu W L, Ma X M, Fei Z, et al. Probing the anisotropic behaviors of black phosphorus by transmission electron microscopy, angular-dependent Raman spectra, and electronic transport measurements. Appl Phys Lett, 2015, 107: 021906CrossRefGoogle Scholar
  81. 81.
    Wang X M, Jones A M, Seyler K L, et al. Highly anisotropic and robust excitons in monolayer black phosphorus. Nat Nanotechnol, 2015, 10: 517–521CrossRefGoogle Scholar
  82. 82.
    Xia F N, Wang H, Jia Y C. Rediscovering black phosphorus as an anisotropic layered material for optoelectronics and electronics. Nat Commun, 2014, 5: 4458Google Scholar
  83. 83.
    Du Y C, Liu H, Deng Y X, et al. Device perspective for black phosphorus field-effect transistors: contact resistance, ambipolar behavior, and scaling. ACS Nano, 2014, 8: 10035–10042CrossRefGoogle Scholar
  84. 84.
    Haratipour N, Robbins M C, Koester S J. Black phosphorus p-MOSFETs with 7-nm HfO2 gate dielectric and low contact resistance. IEEE Electron Dev Lett, 2015, 36: 411–413CrossRefGoogle Scholar
  85. 85.
    Das S, Demarteau M, Roelofs A. Ambipolar phosphorene field effect transistor. ACS Nano, 2014, 8: 11730–11738CrossRefGoogle Scholar
  86. 86.
    Perello D J, Chae S H, Song S, et al. High-performance n-type black phosphorus transistors with type control via thickness and contact-metal engineering. Nat Commun, 2015, 6: 7809CrossRefGoogle Scholar
  87. 87.
    Liu H, Neal A T, Si M W, et al. The effect of dielectric capping on few-layer phosphorene transistors: tuning the schottky barrier heights. IEEE Electron Dev Lett, 2014, 35: 795–797CrossRefGoogle Scholar
  88. 88.
    Padilha J E, Fazzio A, da Silva A J R. van der Waals heterostructure of phosphorene and graphene: tuning the schottky barrier and doping by electrostatic gating. Phys Rev Lett, 2015, 114: 066803CrossRefGoogle Scholar
  89. 89.
    Kamalakar M V, Madhushankar B N, Dankert A, et al. Low schottky barrier black phosphorus field-effect devices with ferromagnetic tunnel contacts. Small, 2015, 11: 2209–2216CrossRefGoogle Scholar
  90. 90.
    Joshua O I, Gary A S, Herre S J V D Z, et al. Environmental instability of few-layer black phosphorus. 2D Mater, 2015, 2: 011002CrossRefGoogle Scholar
  91. 91.
    Wood J D, Wells S A, Jariwala D, et al. Effective passivation of exfoliated black phosphorus transistors against ambient degradation. Nano Lett, 2014, 14: 6964–6970CrossRefGoogle Scholar
  92. 92.
    Boukhvalov D W, Rudenko A N, Prishchenko D A, et al. Chemical modifications and stability of phosphorene with impurities: a first principles study. Phys Chem Chem Phys, 2015, 17: 15209–15217CrossRefGoogle Scholar
  93. 93.
    Wang Z H, Islam A, Yang R, et al. Environmental, thermal, and electrical susceptibility of black phosphorus field effect transistors. J Vac Sci Technol B, 2015, 33: 052202CrossRefGoogle Scholar
  94. 94.
    Saito Y, Iwasa Y. Ambipolar insulator-to-metal transition in black phosphorus by ionic-liquid gating. ACS Nano, 2015, 9: 3192–3198CrossRefGoogle Scholar
  95. 95.
    Kim J-S, Liu Y N, Zhu W N, et al. Toward air-stable multilayer phosphorene thin-films and transistors. Sci Rep, 2015, 5: 8989CrossRefGoogle Scholar
  96. 96.
    Favron A, Gaufres E, Fossard F, et al. Photooxidation and quantum confinement effects in exfoliated black phosphorus. Nat Mater, 2015, 14: 826–832CrossRefGoogle Scholar
  97. 97.
    Ziletti A, Carvalho A, Campbell D K, et al. Oxygen defects in phosphorene. Phys Rev Lett, 2015, 114: 046801CrossRefGoogle Scholar
  98. 98.
    Zhu H, McDonnell S, Qin X Y, et al. Al2O3 on black phosphorus by atomic layer deposition: an in situ interface study. ACS Appl Mater Interface, 2015, 7: 13038–13043CrossRefGoogle Scholar
  99. 99.
    Cai Y Q, Zhang G, Zhang Y-W. Electronic properties of phosphorene/graphene and phosphorene/hexagonal boron nitride heterostructures. J Phys Chem C, 2015, 119: 13929–13936CrossRefGoogle Scholar
  100. 100.
    Chen X L, Wu Y Y, Wu Z F, et al. High-quality sandwiched black phosphorus heterostructure and its quantum oscillations. Nat Commun, 2015, 6: 7315CrossRefGoogle Scholar
  101. 101.
    Doganov R A, Koenig S P, Yeo Y, et al. Transport properties of ultrathin black phosphorus on hexagonal boron nitride. Appl Phys Lett, 2015, 106: 083505CrossRefGoogle Scholar
  102. 102.
    Doganov R A, O’Farrell E C T, Koenig S P, et al. Transport properties of pristine few-layer black phosphorus by van der Waals passivation in an inert atmosphere. Nat Commun, 2015, 6: 6647CrossRefGoogle Scholar
  103. 103.
    Gillgren N, Wickramaratne D, Shi Y M, et al. Gate tunable quantum oscillations in air-stable and high mobility few-layer phosphorene heterostructures. 2D Mater, 2015, 2: 011001CrossRefGoogle Scholar
  104. 104.
    Li L K, Ye G J, Tran V, et al. Quantum oscillations in a two-dimensional electron gas in black phosphorus thin films. Nat Nanotechnol, 2015, 10: 608–613CrossRefGoogle Scholar
  105. 105.
    Tayari V, Hemsworth N, Fakih I, et al. Two-dimensional magnetotransport in a black phosphorus naked quantum well. Nat Commun, 2015, 6: 7702CrossRefGoogle Scholar
  106. 106.
    Yasaei P, Kumar B, Foroozan T, et al. High-quality black phosphorus atomic layers by liquid-phase exfoliation. Adv Mater, 2015, 27: 1887–1892CrossRefGoogle Scholar
  107. 107.
    Kang J, Wood J D, Wells S A, et al. Solvent exfoliation of electronic-grade, two-dimensional black phosphorus. ACS Nano, 2015, 9: 3596–3604CrossRefGoogle Scholar
  108. 108.
    Yang Z B, Hao J H, Yuan S G, et al. Field-effect transistors based on amorphous black phosphorus ultrathin films by pulsed laser deposition. Adv Mater, 2015, 27: 3748–3754CrossRefGoogle Scholar
  109. 109.
    Li X S, Deng B C, Wang X M, et al. Synthesis of thin-film black phosphorus on a flexible substrate. 2D Mater, 2015, 2: 031002CrossRefGoogle Scholar
  110. 110.
    Wang H, Wang X M, Xia F N, et al. Black phosphorus radio-frequency transistors. Nano Lett, 2014, 14: 6424–6429CrossRefGoogle Scholar
  111. 111.
    Vandamme L, Li X S, Rigaud D. 1/f noise in MOS devices, mobility or number fluctuations? IEEE Trans Electron Dev, 1994, 41: 1936–1945CrossRefGoogle Scholar
  112. 112.
    Na J H, Lee Y T, Lim J A, et al. Few-layer black phosphorus field-effect transistors with reduced current fluctuation. ACS Nano, 2014, 8: 11753–11762CrossRefGoogle Scholar
  113. 113.
    Li X F, Du Y C, Si M W, et al. Mechanisms of current fluctuation in ambipolar black phosphorus field-effect transistors. Nanoscale, 2016, 8: 3572–3578CrossRefGoogle Scholar

Copyright information

© Science China Press and Springer-Verlag Berlin Heidelberg 2016

Authors and Affiliations

  1. 1.Wuhan National High Magnetic Field Center and School of Electrical and Electronic EngineeringHuazhong University of Science and TechnologyWuhanChina

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