Defluorination and Mineralization of Difluorophenols in Water by Anodic Contact Glow Discharge Electrolysis
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Abstract
Anodic contact glow discharge electrolysis (CGDE) is a DC-excited atmospheric pressure discharge, in which a steady non-thermal plasma is generated locally between the surface of an electrolytic solution and an anode in contact with it. The I–U characteristics of CGDE were investigated. The plasma temperatures were estimated to be in the range, 1373–2045 K. Hydroxyl radicals and hydrogen peroxide were the main oxidants generated by CGDE. The hydrogen peroxide concentration reached 31.2 mmol/L (mM) in a phosphate buffer solution without organic substrates. During CGDE, the DFPs and the corresponding total organic carbon (TOC) in water were consumed. Most of the fluorine atoms in the DFPs were converted to fluoride ions, and the fluoride concentration increased steadily. An analysis of the hydroxylation of DFPs suggested that the hydroxyl radicals generated by CGDE were the key species responsible for the degradation of DFPs, and the possible mechanistic routes of the mineralization of DFPs are proposed. The disappearance of DFPs and the TOC as well as the defluorination of the DFPs followed first-order kinetics. The rate of TOC disappearance was relatively constant: 1.00 ± 0.05 × 10−2 min−1. The order of disappearance of the DFPs was 2,6-DFP > 2,3-DFP > 2,5-DFP > 2,4-DFP > 3,4-DFP > 3,5-DFP. In contrast, the order of defluorination of the DFPs was 2,5-DFP > 2,3-DFP > 2,6-DFP > 2,4-DFP > 3,4-DFP > 3,5-DFP. Overall, the order of the reaction rates for each DFP was kDFP > kdF > kTOC.
Keywords
Difluorophenol Decomposition Defluorination Anodic contact glow discharge electrolysis First-order rate law pKaNotes
Acknowledgments
This work was supported by the National Natural Science Foundation of China (Grant No. 51308276), Scientific Research Foundation for Doctors of Liaoning Province (Grant No. 20141123), Growth Plan for Distinguished Young Scholars in Colleges and Universities of Liaoning Province China (LJQ2015055), Anshan Science and Technology Program Project (Grant No. 2961), the National Natural Science Foundation of China (51102126), Innovative Research Team in Colleges and Universities of Liaoning Province China (LT2014007), Natural Science Foundation of Liaoning Province, China (2015020634).
References
- 1.Shoute LCT, Mittal JP (1996) J Phys Chem 100:3016CrossRefGoogle Scholar
- 2.Liu YJ, Jiang XZ (2008) Plasma Chem Plasma Process 28(1):15CrossRefGoogle Scholar
- 3.Joshi RP, Thagard SM (2013) Plasma Chem Plasma Process 33(1):17CrossRefGoogle Scholar
- 4.Zeng MD, Zhao K, Lu Y, Ou YJ, Liu DQ, Wang M, Ma YM (2015) Plasma Chem Plasma Process 35(4):721CrossRefGoogle Scholar
- 5.Hao XL, Zhou MH, Zhang Y, Lei LC (2006) Plasma Chem Plasma Process 26(5):455CrossRefGoogle Scholar
- 6.Wen YZ, Jiang XZ, Liu WP (2002) Plasma Chem Plasma Process 22(1):175CrossRefGoogle Scholar
- 7.Du CM, Yan JH, Cheron BG (2007) Plasma Chem Plasma Process 27(5):635CrossRefGoogle Scholar
- 8.Dayal AR, Pfluger D, Kearney TN, Western RJ, McAllister T (2004) Plasma Chem Plasma Process 24(4):573CrossRefGoogle Scholar
- 9.Key BD, Howell RD, Criddle CS (1997) Environ Sci Technol 31:2445CrossRefGoogle Scholar
- 10.Ravichandran L, Selvam K, Swaminathan M (2007) Aust J Chem 60:951CrossRefGoogle Scholar
- 11.Ferreira MIM, Marchesi JR, Janssen DB (2008) Appl Microbiol Biotechnol 78:709CrossRefGoogle Scholar
- 12.Franco AR, Ferreira AC, Castro PML (2014) Chemosphere 111:260CrossRefGoogle Scholar
- 13.Goskonda S, Catallo WJ, Junk T (2002) Waste Manag 22:351CrossRefGoogle Scholar
- 14.Tzedakis T, Savall A, Clifton MJ (1989) J Appl Electochem 19:911CrossRefGoogle Scholar
- 15.Liu YJ (2009) J Hazard Mater 166:1495CrossRefGoogle Scholar
- 16.Yang HM, Matsumoto Y, Tezuka M (2009) J Environ Sci (Suppl 1):142Google Scholar
- 17.Yang HM, Tezuka M (2011) J Phys D Appl Phys 44:155203CrossRefGoogle Scholar
- 18.Yang HM, Tezuka M (2011) J Environ Sci 23:1044CrossRefGoogle Scholar
- 19.Hickling A, Ingram MD (1964) Trans Faraday Soc 60:783CrossRefGoogle Scholar
- 20.Hickling A (1971) In: Bockris JOM, Conway BE (eds) Modern aspects of electrochemistry, vol 6. Butterworths, London, p 329Google Scholar
- 21.Bruggeman P, Leys C (2009) J Phys D Appl Phys 42:053001CrossRefGoogle Scholar
- 22.Bruggeman P, Schram D, Rego R, Kong MG, Leys C (2009) Plasma Sources Sci Technol 18:025017CrossRefGoogle Scholar
- 23.Gangal U, Srivastava M, Sen Gupta SK (2010) Plasma Chem Plasma Process 30(2):299CrossRefGoogle Scholar
- 24.Gaisin AR, Son EE (2005) High Temp 43:1CrossRefGoogle Scholar
- 25.Chen Q, Saito K, Takemura Y, Shirai H (2008) Thin Solid Films 516:6688CrossRefGoogle Scholar
- 26.Yang HM, An BG, Wang SY, Li LX, Jin WJ, Li LH (2013) J Environ Sci 25(6):1Google Scholar
- 27.Yang HM, Cai X, Tezuka M (2013) Plasma Chem Plasma Process 33:1043CrossRefGoogle Scholar
- 28.Wang L, Jiang XZ, Liu YJ (2008) J Hazard Mater 154:1106CrossRefGoogle Scholar
- 29.Jin XL, Wang XY, Zhang HM, Xia Q, Wei DB, Yue JJ (2010) Plasma Chem Plasma Process 30:429CrossRefGoogle Scholar
- 30.Wang XY, Zhou MH, Jin XL (2012) Electrochim Acta 80:501CrossRefGoogle Scholar
- 31.Gong JY, Wang J, Xie WJ, Cai WM (2008) J Appl Electrochem 38:1749CrossRefGoogle Scholar
- 32.Liu YJ (2009) J Hazard Mater 166:1495CrossRefGoogle Scholar
- 33.Gao J, Wang X, Hu Z, Deng H, Hou J, Lu X, Kang J (2003) Water Res 37:267CrossRefGoogle Scholar
- 34.Tomizawa S, Tezuka M (2006) Plasma Chem Plasma Process 26(1):43CrossRefGoogle Scholar
- 35.Minero C, Aliberti C (1991) Langmuir 7:928CrossRefGoogle Scholar
- 36.Aleshina GR, Sokolskaya NN, Sukhina OG (1979) Khim Prom-St Ser Reakt Osobo Chist Ves chestva 3:5Google Scholar