Plasma Chemistry and Plasma Processing

, Volume 32, Issue 5, pp 1075–1091 | Cite as

Treatment and Stability of Sodium Hyaluronate Films in Low Temperature Inductively Coupled Ammonia Plasma

Original Paper

Abstract

Surface of sodium hyaluronate films was modified in the inductively coupled low temperature ammonia plasma. The amount of bonded nitrogen was measured by the XPS method. The optical emission and temperature of the sample surface were measured during sample processing. Increased processing time and increased discharge power caused a rise of nitrogen concentration on the surface of hyaluronan films, though this effect is limited due to surface saturation and sample destruction at elevated discharge power.

Keywords

Hyaluronan Surface modification Surface treatment Low-temperature plasma XPS 

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Copyright information

© Springer Science+Business Media, LLC 2012

Authors and Affiliations

  1. 1.Department of Physics and Material Engineering, Faculty of TechnologyTomas Bata UniversityZlínCzech Republic
  2. 2.Institute of PhysicsZagrebCroatia
  3. 3.Institute Jožef StefanLjubljanaSlovenia
  4. 4.Centre of Polymer SystemsTomas Bata University in ZlínZlínCzech Republic

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