This work deals with the luminous chemical vapour deposition (plasma polymerization) of hydrocarbon polymeric thin films in a magnetic field enhanced discharge of methane. The films were deposited on 4″ <111> single crystal silicon substrates. We investigated the influence of the different glow discharge parameters (e.g. pressure, flow rate, power input, etc.) on the deposition rate of methane and the refractive index of the resulting polymeric films, as well as the distribution of these parameters across the wafer. We used a Shinko Seiki Plasma Polymerization equipment with a bell jar reactor comprising two electrodes connected to a symmetric AC power supply of 15 kHz. Two magnetrons were formed by placing two circular shaped concentric magnetic poles behind each electrode. The substrates were attached on both sides of a rotating wheel held at a floating potential in the middle of the two electrodes. This equipment allowed us to vary a single parameter and keep the other parameters constant over the whole process. We measured the thickness and the refractive index and their distribution over the wafer. The effect of the system pressure, decoupled from the effect of flow rate, is explained by the characteristic nature of luminous gas phase and by the polymerization/deposition mechanism of luminous chemical vapour deposition.
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This study was supported by the Landesstiftung Baden Württemberg gGmbH in the frame of the Research Program “Internationale Spitzenforschung”.
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Ledernez, L., Olcaytug, F., Urban, G.A. et al. Magnetically Enhanced 15 kHz Glow Discharge of Methane. Plasma Chem Plasma Process 27, 659–667 (2007). https://doi.org/10.1007/s11090-007-9098-7
- AF magnetron glow discharge
- Deposition kinetic
- Refractive index