Size-controlled nickel oxide nanoparticle synthesis using mesoporous silicon thin films

  • Joshua S. FainEmail author
  • Jeremy W. Mares
  • Sharon M. Weiss
Research Paper


A process for chemically synthesizing size-controllable nickel oxide (NiO) nanoparticles (NPs) within the interior of mesoporous silicon (PSi) thin films is presented. The method is demonstrated to provide control of the average NP size over an order of magnitude, from 9 nm to 128 nm diameter, by fabricating PSi films with mean pore diameters ranging from 32 to 140 nm and annealing at temperatures between 300 and 1100 °C. NiO NPs are readily detached from the PSi films through electrolytic dissolution of the PSi host matrix. Nanocomposite films and NPs are characterized through x-ray diffraction, scanning electron microscopy, transmission electron microscopy, and energy-dispersive x-ray spectroscopy. Optical absorbance measurements of free NiO NPs in aqueous suspension indicate that the optical bandgap is tuned from 3.65 to 3.9 eV, as expected from the effects of quantum confinement. This synthesis process is amenable to the batch fabrication of a wide variety of metal oxide NPs at temperatures up to 1000 °C with sizes below 100 nm. The method is advantageous over conventional chemical synthesis techniques as it facilitates control of the resulting NP size across a wide range and also permits high-temperature annealing while precluding extended crystallite formation. Furthermore, the use of a PSi template enables direct integration of nanoparticulate metal oxide into Si-based, on-chip applications. NiO was selected here as the model system to demonstrate this technique due to its numerous applications including energy storage and memristor technologies.


Nickel oxide Nanoparticles Porous silicon Sol–gel Nanoscale pores 



This work was supported in part by the National Science Foundation (DMR-1207019). The authors thank J. Keum for assistance with x-ray diffraction measurements and J. R. McBride for assistance with EDX mapping. X-ray diffraction was performed at the Center for Nanophase Materials Sciences, which is a DOE Office of User Science Facility. All other material characterization, including TEM (NSF EPS 1004083), was performed at the Vanderbilt Institute of Nanoscale Science and Engineering. J. S. Fain acknowledges support from a National Science Foundation Graduate Fellowship.


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Copyright information

© Springer Science+Business Media Dordrecht 2015

Authors and Affiliations

  • Joshua S. Fain
    • 1
    Email author
  • Jeremy W. Mares
    • 1
  • Sharon M. Weiss
    • 1
    • 2
  1. 1.Department of Electrical Engineering and Computer ScienceVanderbilt UniversityNashvilleUSA
  2. 2.Department of PhysicsVanderbilt UniversityNashvilleUSA

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