Thin-film transistors with a channel composed of semiconducting metal oxide nanoparticles deposited from the gas phase

  • C. BuschEmail author
  • G. Schierning
  • R. Theissmann
  • A. Nedic
  • F. E. Kruis
  • R. Schmechel
Research Paper


The fabrication of semiconducting functional layers using low-temperature processes is of high interest for flexible printable electronics applications. Here, the one-step deposition of semiconducting nanoparticles from the gas phase for an active layer within a thin-film transistor is described. Layers of semiconducting nanoparticles with a particle size between 10 and 25 nm were prepared by the use of a simple aerosol deposition system, excluding potentially unwanted technological procedures like substrate heating or the use of solvents. The nanoparticles were deposited directly onto standard thin-film transistor test devices, using thermally grown silicon oxide as gate dielectric. Proof-of-principle experiments were done deploying two different wide-band gap semiconducting oxides, tin oxide, SnO x , and indium oxide, In2O3. The tin oxide spots prepared from the gas phase were too conducting to be used as channel material in thin-film transistors, most probably due to a high concentration of oxygen defects. Using indium oxide nanoparticles, thin-film transistor devices with significant field effect were obtained. Even though the electron mobility of the investigated devices was only in the range of 10−6 cmV−1 s−1, the operability of this method for the fabrication of transistors was demonstrated. With respect to the possibilities to control the particle size and layer morphology in situ during deposition, improvements are expected.


Gas-phase deposition Thin-film transistor Semiconducting oxides Nanoparticles 



The authors would like to thank the Deutsche Forschungsgemeinschaft (DFG) for the financial support within the collaborative research center SFB 445.


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Copyright information

© Springer Science+Business Media B.V. 2012

Authors and Affiliations

  • C. Busch
    • 1
    Email author
  • G. Schierning
    • 1
  • R. Theissmann
    • 1
  • A. Nedic
    • 1
  • F. E. Kruis
    • 1
  • R. Schmechel
    • 1
  1. 1.Faculty of Engineering and Center for NanoIntegration Duisburg-Essen (CeNIDE)University of Duisburg-EssenDuisburgGermany

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