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Journal of Sol-Gel Science and Technology

, Volume 62, Issue 1, pp 24–30 | Cite as

Antireflective sol–gel TiO2 thin films for single crystal silicon and textured polycrystal silicon

  • N. H. ArabiEmail author
  • A. Iratni
  • H. El Hamzaoui
  • B. Capoen
  • M. Bouazaoui
  • M. Halbwax
  • J. P. Vilcot
  • S. Bastide
Original Paper

Abstract

In this paper, antireflective TiO2 thin films have been prepared on single crystal silicon, and textured polycrystal silicon by sol–gel route using the dip-coating technique. The thickness and the refractive index of the films have been optimised to obtain low reflexion in the visible region, by controlling both the concentration of the titanium isopropoxide (Ti(iOPr)4), and the annealing temperature. We showed that the use of a TiO2 single layer with a thickness of 64.5 nm, heat-treated at 450 or 300 °C, reduces the reflection on single crystal silicon at a level lower than 3% over the broadband spectral ranges 670–830 nm and 790–1010 nm, respectively. In order to broaden the spectral minimum reflectance as much as possible, we have proposed to texture polycrystal silicon wafers, and to coat these wafers by a TiO2 single layer with a thickness of 73.4 nm. In this case, the reflectance has been reduced from 27 to 13% in the spectral range 460–1000 nm.

Keywords

Thin film Antireflective properties Dip-coating Textured polycrystal silicon Single crystal silicon Titanium oxide 

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Copyright information

© Springer Science+Business Media, LLC 2012

Authors and Affiliations

  • N. H. Arabi
    • 1
    Email author
  • A. Iratni
    • 1
  • H. El Hamzaoui
    • 2
  • B. Capoen
    • 2
  • M. Bouazaoui
    • 2
  • M. Halbwax
    • 3
  • J. P. Vilcot
    • 3
  • S. Bastide
    • 4
  1. 1.LMMC LaboratoryUMBB UniversityBoumerdesAlgeria
  2. 2.PhLAM LaboratoryLille 1 UniversityVilleneuve d’Ascq CedexFrance
  3. 3.IEMN, CNRS UMR 8520Villeneuve d’Ascq CedexFrance
  4. 4.ICMPE, CNRS UMR 7182ThiaisFrance

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