Journal of Sol-Gel Science and Technology

, Volume 53, Issue 2, pp 475–479

Fabrications of Nb-doped TiO2 (TNO) transparent conductive oxide polycrystalline films on glass substrates by sol–gel method

  • Liang Zhao
  • Xiaoru Zhao
  • Jinming Liu
  • An Zhang
  • Danhong Wang
  • Bingbo Wei
Brief Communication

DOI: 10.1007/s10971-009-2102-3

Cite this article as:
Zhao, L., Zhao, X., Liu, J. et al. J Sol-Gel Sci Technol (2010) 53: 475. doi:10.1007/s10971-009-2102-3

Abstract

Anatase Ti0.94Nb0.06O2 (TNO) films were fabricated on glass substrates by sol–gel method using a dip-coating technique. The annealing treatment was separated into two steps, first in air at 350–550 °C for 1 h and then in vacuum of 4.0 × 10−4 Pa at 550 °C for 1 h. The influence of vacuum annealing treatment to the electrical and optical properties was discussed. Especially, the role of air annealing treatment from 350 to 550 °C on the crystallization and the structure of the films was analyzed. It is proved that the films annealed at 550 °C in air and then 550 °C in vacuum exhibited the minimum resistivity of 19.3 Ω·cm and the average optical transmittance of about 75% in the visible range, indicating that the sol–gel method is a feasible and promising method to fabricate TNO films.

Keywords

Nb-doped TiO2 (TNO) Sol–gel Dip-coating Air annealing treatment Vacuum annealing treatment 

Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Liang Zhao
    • 1
  • Xiaoru Zhao
    • 1
  • Jinming Liu
    • 1
  • An Zhang
    • 1
  • Danhong Wang
    • 1
  • Bingbo Wei
    • 1
  1. 1.School of ScienceNorthwestern Polytechnical UniversityXi’anPeople’s Republic of China

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