Fabrications of Nb-doped TiO2 (TNO) transparent conductive oxide polycrystalline films on glass substrates by sol–gel method
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- Zhao, L., Zhao, X., Liu, J. et al. J Sol-Gel Sci Technol (2010) 53: 475. doi:10.1007/s10971-009-2102-3
Anatase Ti0.94Nb0.06O2 (TNO) films were fabricated on glass substrates by sol–gel method using a dip-coating technique. The annealing treatment was separated into two steps, first in air at 350–550 °C for 1 h and then in vacuum of 4.0 × 10−4 Pa at 550 °C for 1 h. The influence of vacuum annealing treatment to the electrical and optical properties was discussed. Especially, the role of air annealing treatment from 350 to 550 °C on the crystallization and the structure of the films was analyzed. It is proved that the films annealed at 550 °C in air and then 550 °C in vacuum exhibited the minimum resistivity of 19.3 Ω·cm and the average optical transmittance of about 75% in the visible range, indicating that the sol–gel method is a feasible and promising method to fabricate TNO films.