Plasma-driven instability of quasi-lamb elastic modes as a mechanism of laser-induced micropatterning of a silicon surface with a silicon dioxide cap
A model of the electron–hole plasma-driven instability of quasi-Lamb elastic modes in semiconductors with a dioxide cap is developed and applied to the description of laser-induced micropatterning of the semiconductor surface. A good correspondence of the theoretical and experimental results is obtained.
Keywordssilicon with silicon dioxide cap laser pulsed irradiation micropatterning of surface plasmainduced instability of static quasi-Lamb modes
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