Abstract
Terahertz (THz) emission increase is observed for GaAs thin films that exhibit structural defects. The GaAs epilayers are grown by molecular beam epitaxy on exactly oriented Si (100) substrates at three different temperatures (Ts = 320 °C, 520 °C and 630 °C). The growth method involves the deposition of two low-temperature-grown (LTG)-GaAs buffers with subsequent in-situ thermal annealing at Ts = 600 °C. Reflection high energy electron diffraction confirms the layer-by-layer growth mode of the GaAs on Si. X-ray diffraction shows the improvement in crystallinity as growth temperature is increased. The THz time-domain spectroscopy is performed in reflection and transmission excitation geometries. At Ts = 320 °C, the low crystallinity of GaAs on Si makes it an inferior THz emitter in reflection geometry, over a GaAs grown at the same temperature on a semi-insulating GaAs substrate. However, in transmission geometry, the GaAs on Si exhibits less absorption losses. At higher Ts, the GaAs on Si thin films emerge as promising THz emitters despite the presence of antiphase boundaries and threading dislocations as identified from scanning electron microscopy and Raman spectroscopy. An intense THz emission in reflection and transmission excitation geometries is observed for the GaAs on Si grown at Ts = 520 °C, suggesting the existence of an optimal growth temperature for GaAs on Si at which the THz emission is most efficient in both excitation geometries. The results are significant in the growth design and fabrication of GaAs on Si material system intended for future THz photoconductive antenna emitter devices.
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Acknowledgement
E. A. Prieto, A. Somintac, E. Estacio and A. Salvador acknowledge the Office of the Chancellor of the University of the Philippines Diliman, through the Office of the Vice Chancellor for Research and Development, for funding support through the Outright Research Grant. The authors also acknowledge the support in part by the Commission on Higher Education Philippine—California Advanced Research Institutes (IIID-2015-013) as well as the assistance of R. Jagus and K. Patrocenio in maintaining the molecular beam epitaxy facility of the National Institute of Physics, University of the Philippines Diliman.
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The conceptualization, analysis, investigation, and validation of the work are credited to KC Gonzales, EA Prieto, E Estacio, and A Salvador. The data acquisition and methodology are performed by KC Gonzales, EA Prieto, GA Catindig, A De Los Reyes, MA Faustino, MA Tumanguil-Quitoras, HA Husay, and JD Vasquez. The manuscript writing is done by KC Gonzales, EA Prieto, GA Catindig, E Estacio, and A Salvador. The supervision, resources, and funding acquisition are through the efforts of EA Prieto, A Somintac, E Estacio, and A Salvador. All authors read and approved the final manuscript.
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Gonzales, K.C., Prieto, E.A., Catindig, G.A. et al. Terahertz emission increase in GaAs films exhibiting structural defects grown on Si (100) substrates using a two-layered LTG-GaAs buffer system. J Mater Sci: Mater Electron 32, 13825–13836 (2021). https://doi.org/10.1007/s10854-021-05958-8
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DOI: https://doi.org/10.1007/s10854-021-05958-8