Fabrication, characterization and hydrogen gas sensing performance of nanostructured V2O5 thin films prepared by plasma focus method
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Nanocrystalline V2O5 thin films were deposited on glass substrates at room temperature using a low energy (1.3 kJ) plasma focus device. The argon:oxygen gas mixture (in 7:3 ratio) was utilized as a working gas and metallic vanadium was used as the anode tip material. The V2O5 thin films were synthesized with different number of shots (10, 20 and 30 shots), at 0° angular position with respect to the anode axis and at same axial position from the tip of anode (10 cm). The structural properties and phase composition of the thin films were studied by means of X-ray diffraction (XRD) and Raman scattering analysis. The results obtained from scanning electron microscopy (SEM), and atomic force microscopy (AFM) analyzes revealed that the size of nanoparticles/agglomerates and surface roughness of V2O5 thin films strongly depend on number of shots. The variation in the gas response of the V2O5 thin films for 1000 ppm concentration of hydrogen gas at different operating temperatures (150–350 °C) revealed an optimal operating temperature of 275 °C. Moreover, among all the V2O5 thin films studied, the sample deposited with ten shots showed the maximum gas response to various H2 concentrations at optimal operating temperature.
The authors wish to acknowledge the Bandar Abbas Branch, Islamic Azad University for financial support and cooperation in implementing this project.
- 10.R. Suresh, K. Giribabu, R. Manigandan, S. Praveen Kumar, S. Munusamy, S. Muthamizh, A. Stephen, V. Narayanan, New electrochemical sensor based on Ni-doped V2O5 nanoplates modified glassy carbon electrode for selective determination of dopamine at nanomolar level, Sens. Actuators B 202, 440–447 (2014).CrossRefGoogle Scholar
- 15.Z.A. Umar, R.S. Rawat, R. Ahmad, Z. Chen, Z. Zhang, J. Siddiqui, A. Hussnain, T. Hussain, M.A. Baig, Structural, compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device. Surf. Interface Anal. 49, 548–553 (2017)CrossRefGoogle Scholar
- 20.M.J. Inestrosa-Izurieta, P. Jauregui, L. Soto, Deposition of materials using a plasma focus of tens of joules. J. Phys. 720, 012045 (2016)Google Scholar
- 23.B.D. Cullity, S.R. Stock, Elements of X-ray diffraction, vol. 3 (Prentice Hall, New-Jersey, 2001)Google Scholar
- 27.A.Gornstein,A.Khelfa,J.P.Guesdon,C.Julien, Effect of the crystallinity of V6O13 films on the electrochemical behaviour of lithium micro batteries, Mater. Res. Soc. Symp. Proc. 369,649–655 (1995).Google Scholar