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Structural, chemical, and electrical properties of ZrO2/Ge system formed via oxidation/nitridation in N2O gas ambient

  • Zhen Ce Lei
  • Nor Ishida Zainal Abidin
  • Yew Hoong Wong
Article

Abstract

The effects of oxidation/nitridation for 15 min at different temperatures (300–800 °C) on metal–oxide–semiconductor characteristics of sputtered Zr thin film based on Ge substrate in N2O ambient have been systematically investigated. The crystallinity of the film were evaluated by X-ray diffraction analysis, Raman analysis, and X-ray photoelectron spectrometer. The crystallite size and microstrain of film were estimated by Williamson–Hall plot analysis. Optical microscope was used to examine samples surface condition and high-resolution transmission electron microscopy was carried out to investigate the cross-sectional morphology. GeO2 was detected in samples with oxidation/nitridation temperature above 700 °C. A possible mechanism of Ge atomic diffusion and its rearrangement in ZrO2 has been proposed and explicated.

Notes

Acknowledgements

This project is financially supported by Frontier Research Grant (FRG) (Grant No.: FG008-17AFR) and Postgraduate Research Grant (PPP) (Grant Nos.: PG221-2015B and PG031-2016A) via University of Malaya (UM) and ScienceFund (Grant No.: 03-01-03-SF1083) via Ministry of Science, Technology and Innovation (MOSTI), Malaysia.

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© Springer Science+Business Media, LLC, part of Springer Nature 2018

Authors and Affiliations

  1. 1.Department of Mechanical Engineering, Faculty of EngineeringUniversity of MalayaKuala LumpurMalaysia

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