Advertisement

Integral nanoindentation evaluation of TiO2, SnO2, and ZnO thin films deposited via spray-pyrolysis on glass substrates

  • Edgar A. VillegasEmail author
  • Rodrigo Parra
  • Leandro RamajoEmail author
Article
  • 23 Downloads

Abstract

Tin, titanium and zinc oxide thin films were deposited on glass substrates by spray-pyrolysis. According to the resolution of XRD and SEM, films are single phase and of uniform surfaces. Elastic modulus and film hardness were studied by instrumented indentation. Friction coefficient and wear volume were determined by nanowear procedures. Low friction coefficient and roughness (< 0.2 and ∼ 7 nm, respectively) were measured. Hardness values (between 6 and 11 GPa) were determined to be in agreement with those reported for similar films grown by physical methods. Titanium and tin dioxide films displayed better wear and mechanical properties than ZnO films.

Notes

Acknowledgements

Thanks are due to V. Fuchs for XRD measurements, to M. Lere for equipment upgrade and design and B. Daga at the triboindenter lab. This work was carried out with the financial support of CONICET, ANPCyT (PICT’15 2305) and University of Mar del Plata.

References

  1. 1.
    M. Asghar, M. Shoaib, F. Placido, S. Naseem, Cent. Eur. J. Phys. 6, 853–863 (2008)Google Scholar
  2. 2.
    M. Giotia, S. Logothetidis, C. Charitidis, Y. Panayiotatos, I. Varsano, Sens. Actuators A Phys. 99, 35–40 (2002)CrossRefGoogle Scholar
  3. 3.
    S.Y. Lien, D.S. Wuu, W.C. Yeh, J.C. Liu, Sol. Energy Mater. Sol. Cells 90, 2710–2719 (2006)CrossRefGoogle Scholar
  4. 4.
    J. Han, Y. Dou, M. Wei, D.G. Evans, X. Duan, Chem. Eng. J. 169, 371–378 (2011)CrossRefGoogle Scholar
  5. 5.
    M. Mazur, D. Wojcieszak, J. Domaradzki, D. Kaczmarek, S. Song, F. Placido, Opto-Electron. Rev. 21(2), 233–238 (2013)CrossRefGoogle Scholar
  6. 6.
    C. Martinet, V. Paillard, A. Gagnaire, J. Joseph, J. Non-Cryst. Solids 216, 77–82 (1997)CrossRefGoogle Scholar
  7. 7.
    N. Lehraki, M.S. Aida, S. Abed, N. Attaf, A. Attaf, M. Poulain, Curr. Appl. Phys. 12, 1283–1287 (2012)CrossRefGoogle Scholar
  8. 8.
    A. Ashour, M.A. Kaid, N.Z. El-Sayed, A.A. Ibrahim, Appl. Surf. Sci. 252, 7844–7848 (2006)CrossRefGoogle Scholar
  9. 9.
    C.Y. Tsay, C.W. Wu, C.M. Lei, F.S. Chen, C.K. Lin, Thin Solid Films 519, 1516 (2010)CrossRefGoogle Scholar
  10. 10.
    W.T. Yen, Y.C. Lin, P.C. Yao, J.H. Ke, Y.L. Chen, Thin Solid Films 518, 3882 (2010)CrossRefGoogle Scholar
  11. 11.
    H.J. Ko, Y.F. Chen, S.K. Hong, H. Wenisch, T. Yao, Appl. Phys. Lett. 77, 3761 (2000)CrossRefGoogle Scholar
  12. 12.
    A.R. Kaul, O.Y. Gorbenko, A.N. Botev, L.I. Burova, Superlattices Microstruct. 38, 272 (2005)CrossRefGoogle Scholar
  13. 13.
    A.C. Fischer-Cripps, Nanoindentation, (Springer, New York, 2004)CrossRefGoogle Scholar
  14. 14.
    S.J. Bull, J. Phys. D Appl. Phys. 38(25), R393 (2005)CrossRefGoogle Scholar
  15. 15.
    S.Y. Chang, Y.C. Huang, Microelectron. Eng. 84, 319 (2007)CrossRefGoogle Scholar
  16. 16.
    J. Malzbender, J.M.J. den Toonder, A.R. Balkenende, Sci. Eng. R 36, 47–103 (2002)CrossRefGoogle Scholar
  17. 17.
    S.Y. Chang, H.L. Chang, Y.C. Lu, S.M. Jang, S.J. Lin, M.S. Liang, Thin Solid Films 460, 164–167 (2004)Google Scholar
  18. 18.
    L. Filipovic, S. Selberherr, Sensors 15, 7206–7227 (2015)CrossRefGoogle Scholar
  19. 19.
    M.A. Ramírez, R. Parra, M.M. Reboredo, J.A. Varela, M.S. Castro, L. Ramajo, Mater. Lett. 64, 1226–1228 (2010)CrossRefGoogle Scholar
  20. 20.
    W.C. Oliver, G.M. Pharr, J. Mater. Res. 7, 1564 (1992)CrossRefGoogle Scholar
  21. 21.
    W.C. Oliver, G.M. Pharr, J. Mater. Res. 19(1), 3–20 (2004)CrossRefGoogle Scholar
  22. 22.
    S.H. Mohamed, J. Alloy. Compd. 510, 119–124 (2012)CrossRefGoogle Scholar
  23. 23.
    Y. Bouachiba, A. Bouvellou, F. Hanini, F. Kermiche, A. Taabouche, K. Boukheddaden, Mater. Sci. 32(1), 1–6 (2014)Google Scholar
  24. 24.
    S. Sathish, B. Chandar Shekar, S. Chandru Kannan, R. Sengodan, K.P.B. Dinesh, R. Ranjithkumar, Int. J. Polym. Anal. Charact. 20(1), 29–41 (2015)CrossRefGoogle Scholar
  25. 25.
    R.M. Pasquarelli, D.S. Ginley, R. O’Hayre, Chem. Soc. Rev. 40, 5406 (2011)CrossRefGoogle Scholar
  26. 26.
    M. Batzill, U. Diebold, Surf. Sci. 79, 47–154 (2005)Google Scholar
  27. 27.
    C. Kilic, A. Zunger, Phys. Rev. Lett. 88, 095501 (2002)CrossRefGoogle Scholar
  28. 28.
    M.D. McCluskey, S.J. Jokela, J. Appl. Phys. 106, 071101 (2009)CrossRefGoogle Scholar
  29. 29.
    K. Ellmer, J. Phys. D Appl. Phys. 34, 3097–3108 (2001)CrossRefGoogle Scholar
  30. 30.
    S.Y. Chang, Y.C. Hsiao, Y.C. Huang, Surf. Coat. Technol. 202, 5416–5420 (2008)CrossRefGoogle Scholar
  31. 31.
    K. Zeng, F. Zhu, J. Hu, L. Shen, K. Zhang, H. Gong, Thin Solid Films 443, 60–65 (2003)CrossRefGoogle Scholar
  32. 32.
    S.K. Wang, T.C. Lin, S.R. Jian, J.Y. Juang, J.S.C. Jang, J.Y. Tseng, Appl. Surf. Sci. 258, 1261–1266 (2011)CrossRefGoogle Scholar
  33. 33.
    T. Fang, W. Chang, Appl. Surf. Sci. 252, 1863–1869 (2005)CrossRefGoogle Scholar
  34. 34.
    S. Wanga, T. Lina, S. Jian, J. Juangb, J. Jangc, J. Tsengd, Appl. Surf. Sci. 258, 1261–1266 (2011)CrossRefGoogle Scholar
  35. 35.
    A. Zeilinger, R. Daniel, T. Schöberl, M. Stefenelli, B. Sartory, J. Keckes, C. Mitterer, Thin Solid Films 581, 75–79 (2015)CrossRefGoogle Scholar
  36. 36.
    P. Sukwisute, R. Sakdanuphab, A. Sakulkalavek, Mater. Today Proc. 4, 6553–6561 (2017)CrossRefGoogle Scholar
  37. 37.
    X. Feng, Y. Zhang, H. Hu, Y. Zheng, K. Zhang, H. Zhou, Appl. Surf. Sci. 422, 266–272 (2017)CrossRefGoogle Scholar
  38. 38.
    U.S. Mbamara, B. Olofinjana, O. Ajayi, C. Lorenzo-Martin, E.I. Obiajunwa, E.O.B. Ajayi, Eng. Sci. Technol. Int. J. 19, 956–963 (2016)CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media, LLC, part of Springer Nature 2018

Authors and Affiliations

  1. 1.Institute of Research in Materials Science and Technology (INTEMA), CONICET - National University of Mar del PlataMar del PlataArgentina

Personalised recommendations