Temperature effects on the structural, optical, electrical and morphological properties of the RF-sputtered Mo thin films
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In this study, the molybdenum (Mo) thin films were deposited onto soda lime glass (SLG) substrates by RF magnetron sputtering method at different temperatures. After the deposition, two of the deposited films were annealed at 500 °C for 30 min under a high purity Argon (Ar) gas atmosphere inside. The all films tested with the tape test had good adhesion to the SLG substrates. The structural and morphological properties of the obtained films were clarified by X-ray diffraction, atomic force microscopy, scanning electron microscopy and energy dispersive X-ray spectroscopy techniques. The films exhibited a strong peak at the range of 40.56 and 41.05 with an orientation of the (110) plane. The electrical and reflectivity properties of the films were investigated by Hall Effect measurements and UV–visible spectroscopy techniques, as a function of the substrate and annealing temperatures. The films had a good resistivity of ~10−4 Ω cm. The films deposited at 250 °C had an average optical reflectivity as high as 48.1 % within the wavelength at the range of 400–1100 nm. In addition, diffused sodium (Na) concentrations into the Mo films from SLG substrate were determined by secondary ion mass spectroscopy. It was seen that Na atoms diffused to Mo layers from SLG substrates.
KeywordsRoot Mean Square Soda Lime Glass Thin Film Solar Cell Back Contact Thermal Annealing Process
This work is supported by Ministry of Development (TR) and TUBITAK under the 2011K120290 and 115F280 project numbers, respectively. The authors would like to thank Sisecam for supporting of SLG substrates.
- 12.P. Huang, C. Huang, M. Lin, C. Chou, C. Hsu, and C. Kuo, Int. J. Photoenergy 2013, Article ID 390824, 8 (2013)Google Scholar
- 22.H.P. Klug, L.E. Alexander, X-ray Diffraction Procedures (Wiley, New York, 1974)Google Scholar
- 23.J.T. Black, R.A. Kohser, De Garmo’s Materials and Processes in Manufacturing, 9th edn. (Wiley, New York, 2013), p. 223Google Scholar