Orientation control of a seeding layer and its effect on structure, ferro- and piezoelectric properties of sol–gel derived Bi3.15Nd0.85Ti3O12 thin films

Article

Abstract

We report on the orientation control of a seeding layer for sol–gel derived Bi3.15Nd0.85Ti3O12 thin films by optimizing the layer thickness and processing parameters including annealing temperature and time. A 75-nm-thick seeding layer with (100) preferential orientation can be obtained on SiO2/Si substrate by annealing at 560 °C for 3 min. The Bi3.15Nd0.85Ti3O12 thin film grown on this optimized seeding layer exhibits a much higher relative intensity of (200) X-ray diffraction peak, which in turn results in more squared PE hysteresis loops, larger remanent polarization (2P r ~ 62 μC/cm2) and piezoelectric coefficient (d 33 ~ 74 pm/V) compared to the film without the optimized first layer prepared using the conventional sequential layer annealing method.

Keywords

Piezoelectric Property Seeding Layer Piezoelectric Coefficient Orientation Control Piezoelectric Response 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgments

This work is supported by funding from the National Natural Science Foundation of China (No. 50972049 and 51172094) and Natural Science Foundation of Shandong Province, China (No. ZR2009FZ008).

References

  1. 1.
    J.F. Scott, C.A. Paz de Araujo, Science 246, 1400 (1989)CrossRefGoogle Scholar
  2. 2.
    C.A. Paz de Araujo, J.D. Cuchiaro, L.D. McMillan, M.C. Scott, J.F. Scott, Nature (London) 374, 627 (1995)CrossRefGoogle Scholar
  3. 3.
    B.H. Park, B.S. Kang, S.D. Bu, T.W. Noh, J. Lee, W. Jo, Nature (London) 401, 682 (1999)CrossRefGoogle Scholar
  4. 4.
    Y. Li, Y. Ma, Y. Zhou, Appl Phys Lett 94, 042903 (2009)CrossRefGoogle Scholar
  5. 5.
    B. Yang, Z. Li, Y. Gao, Y. Lin, C.W. Nan, J Alloys Compd 509, 4608 (2011)CrossRefGoogle Scholar
  6. 6.
    H.N. Lee, D. Hesse, N. Zakharov, U. Gösele, Science 296, 2006 (2002)CrossRefGoogle Scholar
  7. 7.
    T. Watanabe, H. Funakubo, M. Osada, Y. Noguchi, M. Miyayama, Appl Phys Lett 80, 100 (2002)CrossRefGoogle Scholar
  8. 8.
    T. Kojima, T. Watanabe, H. Funakubo, K. Saito, M. Osada, M. Kakihana, J Appl Phys 93, 1707 (2003)CrossRefGoogle Scholar
  9. 9.
    K. Kato, D. Fu, K. Suzuki, K. Tanaka, K. Nishizawa, T. Miki, Appl Phys Lett 84, 3771 (2004)CrossRefGoogle Scholar
  10. 10.
    R. Dat, J.K. Lee, O. Auciello, A.I. Kingon, Appl Phys Lett 67, 572 (1995)CrossRefGoogle Scholar
  11. 11.
    A.D. Rae, J.G. Thompson, R.L. Withers, A.C. Willis, Acta Crystallogr B 46, 474 (1990)CrossRefGoogle Scholar
  12. 12.
    A. Garg, Z.H. Barber, M. Dawber, J.F. Scott, A. Snedden, P. Lightfoot, Appl Phys Lett 83, 2414 (2003)CrossRefGoogle Scholar
  13. 13.
    C.J. Lu, Y. Qiao, Y.J. Qi, X.Q. Chen, J.S. Zhu, Appl Phys Lett 87, 222901 (2005)CrossRefGoogle Scholar
  14. 14.
    H.N. Lee, D. Hesse, N. Zakharov, S.K. Lee, U. Gösele, J Appl Phys 93, 5592 (2003)CrossRefGoogle Scholar
  15. 15.
    T. Watanabe, H. Funakubo, K. Saito, T. Suzuki, M. Fujimoto, M. Osada, Y. Noguchi, M. Miyayama, Appl Phys Lett 81, 1660 (2002)CrossRefGoogle Scholar
  16. 16.
    Y.C. Chen, Y.M. Sun, C.P. Lin, J.Y. Gan, J Cryst Growth 268, 210 (2004)CrossRefGoogle Scholar
  17. 17.
    J. Li, J. Yu, G. Peng, Y. Wang, W. Zhou, J Am Ceram Soc 90, 3220 (2007)CrossRefGoogle Scholar
  18. 18.
    G.D. Hu, J Appl Phys 100, 096109 (2006)CrossRefGoogle Scholar
  19. 19.
    L. Jiao, Z. Liu, G. Hu, S. Cui, Z. Jin, Q. Wang, W. Wu, C. Hang, J Am Ceram Soc 92, 1556 (2009)CrossRefGoogle Scholar
  20. 20.
    K.H. Xue, J. Celinska, C.A. Paz de Araujo, Appl Phys Lett 95, 052908 (2009)CrossRefGoogle Scholar
  21. 21.
    J. Wu, J. Wang, J Phys Chem C 114, 19318 (2010)CrossRefGoogle Scholar
  22. 22.
    J. Wang, J.B. Neaton, H. Zheng, V. Nagarajan, S.B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D.G. Schlom, U.V. Waghmare, N.A. Spaldin, K.M. Rabe, M. Wuttig, R. Ramesh, Science 299, 1719 (2003)CrossRefGoogle Scholar
  23. 23.
    H. Zhang, L. Cheng, B. Jiang, W. Sun, J. Liu, G. Hu, J Mater Sci Mater Electron 23, 1864 (2012)CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media New York 2013

Authors and Affiliations

  1. 1.School of Materials Science and EngineeringUniversity of JinanJinanChina
  2. 2.Department of PhysicsQilu Normal UniversityJinanChina

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