Optical properties of amorphous silicon nitride thin-films prepared by VHF-PECVD using silane and nitrogen

  • Wee Chong Tan
  • S. Kobayashi
  • T. Aoki
  • Robert E. Johanson
  • S. O. Kasap
Article

DOI: 10.1007/s10854-007-9422-2

Cite this article as:
Tan, W.C., Kobayashi, S., Aoki, T. et al. J Mater Sci: Mater Electron (2009) 20(Suppl 1): 15. doi:10.1007/s10854-007-9422-2

Abstract

Hydrogenated amorphous silicon nitride (a-Si1-xNx:H) thin-films with x between 0.42 and 0.58 were deposited from silane diluted in nitrogen gas by VHF PE-CVD using a novel method for impedance matching. We determine the refractive index dispersion relations and the optical absorption edge information from the transmission spectra and report on the changes in the optical properties as the composition is varied. The optical properties of these films are similar to those of silicon nitride deposited using the more conventional silane-ammonia mixtures.

Copyright information

© Springer Science+Business Media, LLC 2007

Authors and Affiliations

  • Wee Chong Tan
    • 1
  • S. Kobayashi
    • 2
  • T. Aoki
    • 2
  • Robert E. Johanson
    • 1
  • S. O. Kasap
    • 1
  1. 1.Department of Electrical and Computer EngineeringUniversity of SaskatchewanSaskatoonCanada
  2. 2.Department of Electronics and Computer Engineering & the Joint Research Center for High-technology (JRCH)Tokyo Polytechnic UniversityAtsugiJapan

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