Development of stable, non-cyanide solutions for electroplating Au-Sn alloy films
- 287 Downloads
- 18 Citations
Abstract
Au-Sn alloys, with a range of compositions, can be successfully pulse plated onto blank wafers and patterned wafers using a slightly acidic, chloride based solution. However, the plating solution has limited stability (about two to three days), after which deposit compositions are not controllable. The aim of this work was to develop a more stable Au-Sn electroplating solution. An alternative, to a single Au-Sn electroplating solution, is to prepare separate Au and Sn solutions and then mix them as needed to generate the Au-Sn solution. Using this approach, Au and Sn solutions were produced, which were stable for at least 12 months. The stable Au solution consisted of KAuCl4, ammonium citrate, and sodium sulfite; the stable Sn solution consisted of SnCl2 • 2H2O and ammonium citrate. Ascorbic acid is an important bridge component between the 2 solutions. Electroplating results showed that deposit composition, morphology and plating rate from the newly developed mixture were very similar to those obtained from the conventional Au-Sn solution.
Keywords
Chloride 2H2O Citrate Ascorbic Acid Electronic MaterialPreview
Unable to display preview. Download preview PDF.
References
- 1.W. SUN and D. G. IVEY, Materi. Sci. Eng., B65 (1999) 111.Google Scholar
- 2.B. DJURFORS and D. G.IVEY, J. Electr. Mater., 30 (2001) p. 1249.CrossRefGoogle Scholar
- 3.A. HE, B. DJURFORS, S. AKHLAGHI and D. G. IVEY, Plating and Surface Finishing, 89 (2002) 48.Google Scholar
- 4.B. DJURFORS, Pulsed Electrodeposition of a Au/Sn Eutectic Solder (MSc Thesis, University of Alberta, 2001).Google Scholar
- 5.A. HE, Q. LIU and D. G. IVEY, “Plating and Surface Finishing” 92 (2005) 30.Google Scholar
- 6.C. N. R. RAO, “Ultra-violet and Visible Spectroscopy”, 3rd edition (Butterworth, Boston, MA, 1975) pp. 13–59.Google Scholar
- 7.D. J. SHAW, Introduction to Colloid & Surface Chemistry, 4th Edition (Butterworth-Heinemann, Oxford, UK, 1992) p. 53.Google Scholar
- 8.D. J. ARROWSMITH and K.J. LODGE, Transactions of the Institute of Metal Finishing, 65 (1987) 120.Google Scholar
- 9.F. A. COTTON and G. WILKINSON, “Advanced Inorganic Chemistry”, 5th ed. (Wiley, New York, 1988) pp. 948–951.Google Scholar
- 10.H. HONMA and K. HAGIWARA, J. Electr. Soci., 142 (1995) 81.Google Scholar
- 11.P. A. KOHL, “Modern Electroplating”, 4th Edition M. Schlesinger and M. Paunovic, Eds. (John Wiley & Sons, New York, NY, 2000) p. 201.Google Scholar
- 12.CRC Handbook of Chemistry and Physics, 78th edition, D. R. Lide, Ed., Boca Raton, Florida, CRC Press, (1997–1998) p. 8.Google Scholar
- 13.C. K. JÖRGENSEN, Advances in Chemical Physics, Vol. 5, I. Prigogine, Ed., (Wiley, New York, 1963), p. 120.Google Scholar