Journal of Materials Science

, Volume 54, Issue 8, pp 6381–6392 | Cite as

Fully embedded CuNWs/PDMS conductor with high oxidation resistance and high conductivity for stretchable electronics

  • Bowen Zhang
  • Wanli Li
  • Yang Yang
  • Chuantong Chen
  • Cai-Fu LiEmail author
  • Katsuaki SuganumaEmail author
Electronic materials


In typical CuNWs-based conductors, CuNWs are deposited on or semi-embedded in the surface of substrates, which cannot avoid the oxidation. Here, we report a strategy to fabricate highly conductive and stretchable conductor with enhanced reliability and robustness through fully embedding CuNWs into the surface layer of poly(dimethylsiloxane) (PDMS) and followed with a high-intensity pulsed light technique. The light energy absorbed by the film not only removes the oxides on the surface of nanowires but also enhances the inter-nanowire connection to achieve high conductivity. The fully embedded CuNWs/PDMS structure showed excellent oxidation resistance in high-humidity and high-temperature environments (85 °C, 85% RH), and maintained a low sheet resistance when subjected to 30% of strain for 1000 cycles. Stretchable dipole antenna was fabricated using the fully embedded CuNWs/PDMS conductors, which retained its sensitivity to specific radio frequencies even after 500 cycles of the stretching/releasing process. Furthermore, a stretchable conductive heater was demonstrated, verifying the applicability of our fully embedded conductor for wearable electronics. We believe this work might open up new opportunities for the wide range of practical applications of CuNW-based conductors.



B.Z. acknowledges the financial support from the China Scholarship Council for Ph.D. research (Grant 201706170023) at Osaka University. This work was also supported by Dynamic Alliance for Open Innovation Bridging Human, Environment and Materials from MEXT, Japan. The authors are thankful to the Comprehensive Analysis Center of Osaka University for TEM characterization and to T. Ishibashi for assistance with TEM.

Compliance with ethical standards

Conflicts of interest

There are no conflicts to declare.

Supplementary material

10853_2019_3333_MOESM1_ESM.docx (1.9 mb)
Supplementary material 1 (DOCX 1913 kb)


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Copyright information

© Springer Science+Business Media, LLC, part of Springer Nature 2019

Authors and Affiliations

  1. 1.Department of Adaptive Machine Systems, Graduate School of EngineeringOsaka UniversityOsakaJapan
  2. 2.The Institute of Scientific and Industrial Research (ISIR)Osaka UniversityOsakaJapan
  3. 3.Pacific Northwest National LaboratoryRichlandUSA

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